Mr. Mark R. Laurance Profile

Mark R. Laurance

Product Marketing Manager at Aprio Technologies Inc

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 8 November 2005 Paper

Enabling incremental RET to exploit hierarchical structure across multiple designs for sub-100 nm lithography

Mark Laurance, Melissa Anderson, Mark Pilloff

Proceedings Volume 5992, 59922S (2005) https://doi.org/10.1117/12.631875

KEYWORDS: Optical proximity correction, Manufacturing, Resolution enhancement technologies, Design for manufacturability, Process modeling, Lithography, Model-based design, Structural design, Data modeling, Photomasks

Read Abstract +

Proceedings Article | 7 November 2005 Paper

Applying reconfigurable RET across process window to create more robust manufacturing designs

Mark Laurance, Abhishek Vikram, Melody Ma, William Volk, Melissa Anderson, Scott Andrews, Bo Su, Hong Du, Gaurav Verma

Proceedings Volume 5992, 59921X (2005) https://doi.org/10.1117/12.631877

KEYWORDS: Optical proximity correction, Inspection, Resolution enhancement technologies, Manufacturing, Design for manufacturability, Model-based design, Photomasks, Lithography, Defect inspection, Semiconducting wafers

Read Abstract +

Proceedings Article | 16 August 2002 Paper

Productivity and OPC reticle inspectability using multibeam UV wavelength inspection

Mark Laurance, Dino Hsieh, Vincent Wen

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479354

KEYWORDS: Inspection, Reticles, Optical proximity correction, Semiconducting wafers, Ultraviolet radiation, Lithography, Photomasks, Defect detection, Contamination, Deep ultraviolet

Read Abstract +

Proceedings Article | 11 March 2002 Paper

Productivity and OPC reticle inspectability using multibeam UV wavelength inspection

Dino Hsieh, Vincent Wen, Mark Laurance

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458280

KEYWORDS: Inspection, Reticles, Optical proximity correction, Semiconducting wafers, Ultraviolet radiation, Lithography, Defect detection, Contamination, Deep ultraviolet, Phase shifts

Read Abstract +

Proceedings Article | 22 January 2001 Paper

Subtractive defect repair via nanomachining

Mark Laurance

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410683

KEYWORDS: Quartz, Photomasks, Atomic force microscopy, Nanotechnology, Binary data, Scanning electron microscopy, Chromium, Photomask technology, Time metrology

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years