Planar metamaterials, or metasurfaces, have recently gained attention to realize ultra-thin, functional optical components. Metalenses, or metasurfaces with light-focusing capabilities, have gained attention to greatly reduce the size of conventional optics, including in the terahertz regime. The fabrication of metalenses currently relies on lithography techniques utilized in a clean room environment, and a simpler fabrication method is needed for more extensive use of metalenses. In this study, we report the fabrication of a THz metalens by using femtosecond laser ablation in a standard laboratory environment. The metalens, targeted at 0.8 THz, was fabricated by drilling through-holes with a 343-nm ultraviolet femtosecond laser on a 75-μm-thick high-resistivity silicon substrate. We evaluate the performance of the fabricated metalens with a THz imaging setup, and measure a focused spot full width at half maximum (FWHM) of 0.9 mm and a focusing efficiency of 67.8% when compared to a commercially available lens, results comparable to lithography fabricated metalenses. These results demonstrate the feasibility of the combination of laser processing with metasurface fabrication for the THz region, and represent a new, more versatile alternative to lithography for THz metalens fabrication.
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