KEYWORDS: Metals, Design and modelling, 3D acquisition, Wafer bonding, Dysprosium, Back end of line, Semiconducting wafers, Electronic design automation, Logic, 3D image capture
Fine-pitch 3D integration is considered a promising way to advance traditional CMOS scaling as 3D interconnects are currently capable to match the connectivity among functional sub-blocks of a system, enabling their displacement on different tiers. A major bottleneck for 3D ICs is represented by the power delivery, due to the challenge of supplying multiple dies. This work aims to provide insights into the system-level impact of PDN in a 3D chip, in terms of frequency and IR drop. A highly-interconnected memory-dominated SoC is physically implemented using the same 2nm technology in 2D and 3D. For both options, the results are compared with an ideal PDN-less implementation, showing that 3D-induced frequency (up to 9.3%) and wirelength (∼ 10%) benefits are retained upon PDN insertion. From the power integrity perspective, a ∼ 60mV dynamic IR drop improvement is observed in 3D, compared to a conventional frontside PDN in 2D, when considering the 90th percentile of a cumulative distribution function. This work validates the expected technology-driven benefits of 3D integration at the system physical design level, in a realistic environment including a 3D PDN.
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