We developed and fabricated a single layer antireflection coating for the molybdenum/silicon multilayer mirrors.The 20 nm thin film of Si0.52C0.16N0.29, deposited by simultaneous electron beam evaporation and nitrogen ion implantation, causes a broadband suppression of the DUV reflectance with a maximum suppression at λ= 285 nm from 58% to 0.3%, corresponding to a factor of 195.
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