Dr. Shairfe Muhammad Salahuddin Profile

Dr. Shairfe Muhammad Salahuddin

at Intel Corp

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Author

Publications (3)

Proceedings Article | 28 April 2023 Poster + Paper

Cost analysis of device options and scaling boosters below the A14 technology node

G. Mirabelli, A. Vandooren, C. Roda Neve, V. Gonzalez, H. Mertens, A. Farokhnejad, P. Schuddinck, G. Murdoch, S. Salahuddin, O. Zografos, L. Ragnarsson, P. Weckx, Z. Tokei, G. Hellings, J. Ryckaert

Proceedings Volume 12495, 124951K (2023) https://doi.org/10.1117/12.2656456

KEYWORDS: Semiconducting wafers, Metals, Back end of line, Silver, Optical lithography, Transmission electron microscopy, Nanosheets, Front end of line, Wafer bonding, Semiconductors

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Proceedings Article | 28 April 2023 Presentation + Paper

DTCO of sequential and monolithic CFET SRAM

Hsiao-Hsuan Liu, Shairfe Salahuddin, Boon Teik Chan, Pieter Schuddinck, Yang Xiang, Pieter Weckx, Geert Hellings, Francky Catthoor

Proceedings Volume 12495, 124950Z (2023) https://doi.org/10.1117/12.2657524

KEYWORDS: Fin field effect transistors, Silicon, Back end of line, Design rules, Metals, Transistors, Resistance, Fabrication, Epitaxy, Nanosheets

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Proceedings Article | 28 April 2023 Presentation + Paper

Design-technology co-optimization overview of CFET architecture

G. Mirabelli, P. Schuddinck, H.-H. Liu, S. Yang, O. Zografos, S. Salahuddin, P. Weckx, G. Hiblot, G. Hellings, J. Ryckaert

Proceedings Volume 12495, 124950M (2023) https://doi.org/10.1117/12.2657726

KEYWORDS: Semiconducting wafers, Back end of line, Nanosheets, Logic, Standards development, Metals, Fin field effect transistors, Semiconductors, Optical lithography, Nanotechnology

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