Dr. Shun-Der Wu
at ASML Taiwan Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 12 December 2009 Paper
Proceedings Volume 7520, 752025 (2009) https://doi.org/10.1117/12.837495
KEYWORDS: Source mask optimization, Scanners, Photomasks, Reticles, Diffractive optical elements, Double patterning technology, Etching, Lithography, Error analysis

SPIE Journal Paper | 1 January 2009
Michael Crouse, Ryusuke Uchida, Youri van Dommelen, Tomoyuki Ando, Emil Schmitt-Weaver, Masaru Takeshita, Shunder Wu, Robert Routh
JM3, Vol. 8, Issue 01, 011006, (January 2009) https://doi.org/10.1117/12.10.1117/1.3042219
KEYWORDS: Double patterning technology, Image processing, Nanoimprint lithography, Critical dimension metrology, Photoresist processing, Printing, Reticles, Cadmium, Lithography, Line width roughness

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