Dr. So-Yeon Baek Profile

Dr. So-Yeon Baek

at Boston Univ

SPIE Involvement:

Author

Publications (7)

SPIE Journal Paper | 1 January 2005

Simulation of the coupled thermal/optical effects for liquid immersion nanolithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Gregory Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad, Mordechai Rothschild, Michael Switkes

JM3, Vol. 4, Issue 01, 013002, (January 2005) https://doi.org/10.1117/12.10.1117/1.1858331

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Microfluidics, Wafer-level optics, Refraction, Computational fluid dynamics, Optical lithography, Microfluidic imaging, Photomasks

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Proceedings Article | 28 May 2004 Paper

Simulation of the coupled thermal optical effects for liquid immersion micro-/nano-lithography

So-Yeon Baek, Alexander Wei, Daniel Cole, Greg Nellis, Michael Yeung, Amr Abdo, Roxann Engelstad

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537574

KEYWORDS: Semiconducting wafers, Liquids, Thermal effects, Protactinium, Wafer-level optics, Refraction, Computational fluid dynamics, Microfluidics, Immersion lithography, Microfluidic imaging

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SPIE Journal Paper | 1 January 2004

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637365

KEYWORDS: Liquids, Photoresist materials, Binary data, Immersion lithography, Refraction, Thin films, Printing, Phase shifts, Optical lithography, Projection systems

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Proceedings Article | 26 June 2003 Paper

Simulation study of process latitude for liquid immersion lithography

So-Yeon Baek, Daniel Cole, Mordechai Rothschild, Michael Switkes, Michael Yeung, Eytan Barouch

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504600

KEYWORDS: Liquids, Binary data, Immersion lithography, Photoresist materials, Photomasks, Refraction, Printing, Optical lithography, Thin films, Projection systems

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Proceedings Article | 12 July 2002 Paper

Evolution and integration of optimal IC design: performance and manufacturing issues

Daniel Cole, So-Yeon Baek, Xima Zhang

Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475683

KEYWORDS: Manufacturing, Microelectronics, Computer aided design, Semiconductors, Design for manufacturability, Yield improvement, Nanoelectronics, Lithography, Field effect transistors, Control systems

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Proceedings Article | 7 June 1996 Paper

Effect of numerical aperture and partial coherence to the resist sidewall angle

Hye-Keun Oh, Byoung Sub Nam, So-Yeon Baek

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240976

KEYWORDS: Absorption, Photoresist processing, Lithography, Physics, Image enhancement, Chemistry, Radon, Electronics

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Proceedings Article | 7 June 1996 Paper

Image and resist profile by sublayer variation in deep-UV lithography

Hye-Keun Oh, So-Yeon Baek, Seung-Wook Park, Kun-Sang Lee

Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240960

KEYWORDS: Photomasks, Deep ultraviolet, Lithography, Photoresist processing, Oxides, Super resolution, Binary data, Optical lithography, Image filtering, Antireflective coatings

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Showing 5 of 7 publications

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