Mr. Tetsunari Furusho Profile

Tetsunari Furusho

at Tokyo Electron Kyushu Ltd

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Author

Publications (2)

Proceedings Article | 31 March 2010 Paper

Topcoat-less resist process development for contact layer of 40nm node logic devices

Masafumi Fujita, Takayuki Uchiyama, Tetsunari Furusho, Takahisa Otsuka, Katsuhiro Tsuchiya

Proceedings Volume 7639, 763923 (2010) https://doi.org/10.1117/12.846270

KEYWORDS: Photoresist processing, Logic devices, Semiconducting wafers, Lithography, Immersion lithography, Thin film coatings, Yield improvement, Resistance, Electronics, Scanners

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Proceedings Article | 24 May 2004 Paper

Multivariate analysis of a 100-nm process measured by in-line scatterometry

Sebastien Egret, Tetsunari Furusho, Bart Baudemprez

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.535455

KEYWORDS: Semiconducting wafers, Scatterometry, Diffractive optical elements, Coating, Reflectivity, Scatter measurement, Process modeling, Process control, Critical dimension metrology, Photoresist processing

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