Tomohiro Takayama
at Yamaguchi Univ
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 13 July 2017 Paper
Shunsuke Ochiai, Tomohiro Takayama, Yukiko Kishimura, Hironori Asada, Manae Sonoda, Minako Iwakuma, Ryoichi Hoshino
Proceedings Volume 10454, 1045414 (2017) https://doi.org/10.1117/12.2279079
KEYWORDS: Dry etching, Resistance, Chlorine, Chemical species, Scanning electron microscopy, Argon, Photomasks, Polymethylmethacrylate, Photoresist processing, Electron beam lithography

Proceedings Article | 4 October 2016 Paper
Shunsuke Ochiai, Tomohiro Takayama, Yukiko Kishimura, Hironori Asada, Manae Sonoda, Minako Iwakuma, Ryoichi Hoshino
Proceedings Volume 9985, 99851L (2016) https://doi.org/10.1117/12.2242986
KEYWORDS: Electron beams, Photoresist processing, Polymers, Photomasks, Electron beam lithography, Resistance, Polymethylmethacrylate, Halogens, Scanning electron microscopy, Photomask technology

Proceedings Article | 10 May 2016 Paper
Tomohiro Takayama, Hironori Asada, Yukiko Kishimura, Shunsuke Ochiai, Ryoichi Hoshino, Atsushi Kawata
Proceedings Volume 9984, 99840L (2016) https://doi.org/10.1117/12.2240296
KEYWORDS: Electron beams, Line width roughness, Polymers, Scanning electron microscopy, Photoresist processing, Photomasks, Line edge roughness, Electron beam lithography, Nanoimprint lithography, Dry etching

Proceedings Article | 23 October 2015 Paper
Tomohiro Takayama, Hironori Asada, Yukiko Kishimura, Ryoichi Hoshino, Atsushi Kawata
Proceedings Volume 9635, 96351K (2015) https://doi.org/10.1117/12.2196942
KEYWORDS: Polymers, Line width roughness, Scanning electron microscopy, Electron beams, Photomasks, Dry etching, Resistance, Plasma, Line edge roughness, Etching

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top