Prof. Toshiyuki Horiuchi Profile

KEYWORDS: Light emitting diodes, Polymer optical fibers, Lithography, Printing, Optical fibers, Optical arrays, Heat treatments, Optical lithography, LCDs, Lamps, Aluminum, Transmittance, Polishing

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Proceedings Article | 10 May 2016 Paper

Laser-Scan Lithography onto Ultra-Fine Pipes 100 μm in diameter

Hiroshi Takahashi, Tomoya Sagara, Toshiyuki Horiuchi

Proceedings Volume 9984, 99840J (2016) https://doi.org/10.1117/12.2240158

KEYWORDS: Lithography, Etching, Photomasks, Objectives, Laser systems engineering, Printing, Light sources, Projection systems, Metals, Sputter deposition

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Proceedings Article | 10 May 2016 Paper

Synchronous scan-projection lithography for fabricating cylindrical micro-parts

Kaiki Ito, Yuta Suzuki, Toshiyuki Horiuchi

Proceedings Volume 9984, 99840I (2016) https://doi.org/10.1117/12.2240273

KEYWORDS: Lithography, Reticles, Optical lithography, Printing, 3D scanning, Photomasks, Current controlled current source, Light sources, Mercury

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Proceedings Article | 10 May 2016 Paper

Technology for fabricating micro-lens arrays utilizing lithographically replicated concave resist patterns

Noa Kobayashi, Ryunosuke Sasaki, Toshiyuki Horiuchi

Proceedings Volume 9984, 99840H (2016) https://doi.org/10.1117/12.2240157

KEYWORDS: Projection lithography, Epoxies, Semiconducting wafers, Polishing, Silicon, Optical lithography, Lithography, Printing, Adhesives, Transmittance, Reticles

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Proceedings Article | 25 March 2016 Paper

Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin

Atsushi Sekiguchi, Yoko Matsumoto, Hatsuyuki Tanaka, Toshiyuki Horiuchi, Yoshihisa Sensu, Satoshi Takei, Makoto Hanabata

Proceedings Volume 9779, 97791L (2016) https://doi.org/10.1117/12.2218948

KEYWORDS: Picture Archiving and Communication System, Lithography, Astatine, Optical lithography, Flat panel displays, Microelectromechanical systems, Electroluminescence, Solids, Manufacturing, Photoresist processing

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Proceedings Article | 9 July 2015 Paper

Fabrication of microfluidic paths using thick and vertical resist patterns printed by exposure with intentional large defocus

Yuta Morizane, Toshiyuki Horiuchi

Proceedings Volume 9658, 965816 (2015) https://doi.org/10.1117/12.2192936

KEYWORDS: Microfluidics, Semiconducting wafers, Thin films, Absorption, Lithography, Optical lithography, Photomasks, Printing, Light sources, Ultraviolet radiation

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Proceedings Article | 9 July 2015 Paper

Investigation into causes of resolution degradation in projection exposure using a gradient-index lens array

Takanori Sato, Toshiyuki Horiuchi

Proceedings Volume 9658, 965815 (2015) https://doi.org/10.1117/12.2192973

KEYWORDS: GRIN lenses, Lithography, Reticles, Optical lithography, Semiconducting wafers, Flex printed circuits, Flexible circuits, Microfluidics, Contact lenses, Printing

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Proceedings Article | 9 July 2015 Paper

Readability of intentionally degraded two dimensional code marks printed lithographically using a squared optical fiber matrix

Jun Watanabe, Jun-ya Iwasaki, Toshiyuki Horiuchi

Proceedings Volume 9658, 965817 (2015) https://doi.org/10.1117/12.2192647

KEYWORDS: Light emitting diodes, Semiconducting wafers, Optical fibers, Mercury, Lamps, Lithography, Printing, Prototyping, Polymer optical fibers, Light sources and illumination

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Proceedings Article | 28 June 2013 Paper

Projection exposure using a projector with highly minute liquid crystal display panels

Soichiro Koyama, Kenji Saito, Toshiyuki Horiuchi

Proceedings Volume 8701, 87010U (2013) https://doi.org/10.1117/12.2027570

KEYWORDS: LCDs, Projection systems, Optical lithography, RGB color model, Reticles, Printing, Light sources, Semiconducting wafers, Projection lithography, Microelectromechanical systems

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Proceedings Article | 3 July 1995 Paper

Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends

Toshiyuki Horiuchi, Katsuhiro Harada, Yoshinobu Takeuchi, Yoshiaki Mimura, Emi Tamechika

Proceedings Volume 2512, (1995) https://doi.org/10.1117/12.212793

KEYWORDS: Lithographic illumination, Optical lithography, Lithography, Reticles, Diffraction, Resolution enhancement technologies, Semiconducting wafers, Holmium, Electromagnetic coupling, Projection systems

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