Mr. Wolfram A. Neff Profile

Wolfram A. Neff

at Energetiq Technology Inc.

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Proceedings Article | 26 May 2022 Poster + Paper

Simulation of a discharge produced plasma (DPP) for Blue-X (6.x nm) EUV radiation

D. Reisman, K. Saito, W. Neff

Proceedings Volume 12051, 120510U (2022) https://doi.org/10.1117/12.2628996

KEYWORDS: Extreme ultraviolet, Plasma, Neon, Xenon, Metrology, Chromium, Radiation effects, Ions, Inspection, Fusion energy

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The EQ-10 Electrodeless Z-pinchTM source uses Xenon plasma to produce 13.5 nm (±1% BW) radiation. The source is used for metrology, mask inspection, and resist development. In this talk we will present modeling of the EQ-10 Z-pinch using the Trac-II radiation magnetohydrodynamic (RMHD) code. Specifically, we use RMHD calculations to explore development of the Electrodeless Z-pinch as a source of Blue-X (6.x nm) radiation. Critical to this study are the nonLTE effects on radiation physics and the equation of state. For this we rely on the FLYCHK collisional-radiative model to determine the radiative power loss. We also use the FLYCHK calculated emissivity to estimate the Blue-X power output. We revisit previous experimental attempts at obtaining Blue-X EUV radiation with neon gas. Having established a baseline of performance on our present Z-pinch system, we use RMHD calculations to scale to higher outputs of potential interest to the EUV community.

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