Zirconium nitride (ZrN) combines plasmonic properties in the visible and near infrared spectral region with good mechanical properties, high thermal and chemical stability making it a very promising alternative to noble metals for optical applications at high temperature or in extreme environments. The authors present a new process for the elaboration of micro-nanostructured ZrN from a photo-patternable ZrO2 sol-gel and a nitridation process, by rapid thermal annealing. This sol-gel is patternable by optical lithography, it allows to easily and quickly produce patterned ZrN layer.
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