Ms. Yilei Zeng Profile

Yilei Zeng

at ChangXin Memory Technologies Inc

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Author

Publications (6)

Proceedings Article | 21 November 2023 Poster + Paper

Research of mask photoresist sensitivity for local critical dimension uniformity improvement in ArF lithography

Yilei Zeng, Yi Cheng, Yu Zhang, Peisheng Li, Zhong Zhang, Min Zhou, Xin Zhang

Proceedings Volume 12751, 1275119 (2023) https://doi.org/10.1117/12.2687170

KEYWORDS: Photoresist materials, Lithography, Semiconducting wafers, Advanced patterning, Semiconductors, Photoresist developing, Shrinkage, Power consumption, Line width roughness, Line edge roughness

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Proceedings Article | 21 November 2023 Poster + Paper

An advanced 2D feature transmitted algorithm for mask defect detection

Yilei Zeng, Yi Cheng, Mengyao Jin, Hunter Li

Proceedings Volume 12751, 127510Z (2023) https://doi.org/10.1117/12.2684046

KEYWORDS: Semiconducting wafers, Inspection, Transmittance, Algorithm development, Air contamination, Image processing, Detection and tracking algorithms, Defect detection, Visualization, Inspection equipment

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Proceedings Article | 21 November 2023 Poster + Paper

Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology

Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi

Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740

KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing

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Proceedings Article | 21 November 2023 Poster + Paper

How to improve intra-field CDU of contact hole patterns in both X-Y directions with CDC technology

Yilei Zeng, Xiuxuan Zhang, Levi Tang, Yingjie Wang, Pei Su, Adam Liu, Claire Zhang

Proceedings Volume 12751, 1275112 (2023) https://doi.org/10.1117/12.2685350

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanners, Printing, Manufacturing, Lithography, Light sources and illumination, Factor analysis, Design and modelling, Attenuation

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Proceedings Article | 1 December 2022 Paper

Haze classification based on location for COG mask

Yilei Zeng, Yu Zhang, Debao Ding, Hunter Li

Proceedings Volume 12293, 122930W (2022) https://doi.org/10.1117/12.2640331

KEYWORDS: Air contamination, Photomasks, Semiconducting wafers, Quartz, Manufacturing, Mask cleaning

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Proceedings Article | 1 December 2022 Poster + Paper

Research of high-transmission phase-shift mask on critical dimension uniformity in ArF lithography

Yilei Zeng, Yi Cheng, Peisheng Li, Teng Zhang, Zhong Zhang, Yu Zhang, Debao Ding

Proceedings Volume 12293, 122930X (2022) https://doi.org/10.1117/12.2641687

KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Nanoimprint lithography, Phase shifts, Metrology, Scanning electron microscopy, Polarization, Lithographic illumination, Transmittance

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Showing 5 of 6 publications

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