Mr. Ying Luo Profile

Ying Luo

Field Applications Engineer at Tokyo Electron America Inc

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Publications (3)

Proceedings Article | 24 March 2009 Paper

Process optimization for optical CD correlation improvement of ADI and AEI 3D structure by using iODP

Anice Lee, Chung-Yi Lin, F. Y. Chen, Wen-Hao Chang, Sean Hsu, Allen Li, Ying Luo, Youxian Wen

Proceedings Volume 7272, 727244 (2009) https://doi.org/10.1117/12.814023

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Photoresist processing, Process control, Finite element methods, Etching, Wafer-level optics, Metrology, Silicon, Reflectometry

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Proceedings Article | 1 December 2008 Paper

Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure

Marlene Strobl, Lisa Huang, Allen Li, Ying Luo, Youxian Wen

Proceedings Volume 7140, 71400G (2008) https://doi.org/10.1117/12.804636

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Scatterometry, Metrology, Mathematical modeling, Data modeling, Thin films, Integrated optics, Process control, Optical properties

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Proceedings Article | 25 March 2008 Paper

Development of back-end-of-the-line applications using optical digital profilometry (ODP)

Jun-Ji Huang, J. H. Yeh, Ying Luo, Li Wu, Youxian Wen

Proceedings Volume 6922, 69223K (2008) https://doi.org/10.1117/12.769257

KEYWORDS: Transmission electron microscopy, Copper, Etching, Reflectometry, Metrology, Chemical mechanical planarization, Critical dimension metrology, Back end of line, Photomasks, Metals

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