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Yoon Jong Han
at Hanyang Univ
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Publications (1)
Proceedings Article | 22 February 2021 Poster + Presentation
Fabrication and evaluation of nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography
Dongmin Jeong, Yoon Jong Han, Deuk Gyu Kim, Yunsoo Kim, Jinho Ahn
Proceedings Volume 11609, 116091U (2021) https://doi.org/10.1117/12.2586778
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Nickel, Mass attenuation coefficient, Dry etching, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet, Crystals
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