Despite being crucial in an optical lithography process, “dose” has remained a relative concept in the computational lithography regime. It usually takes the form of a percentage deviation from a pre-identified “nominal condition” under the same illumination shape. Dose comparison between different illumination shapes has never been rigorously defined and modeled in numerical simulation to date. On the other hand, the exposure-limited nature of EUV lithography throughput demands the * illumination shape being optimized with the physical dose impact consciously taken into consideration. When the projection pupil is significantly obscured (as in the ASML EXE high NA scanner series), the lack of a proper physical dose constraint may lead to suboptimal energy utilization during exposure. In this paper, we demonstrate a method to accurately model the physical dose in an optical lithography process. The resultant dose concept remains meaningful in the context of a changing illumination pupil, which enables co-optimization of imaging quality and a throughput metric during the Source-Mask Optimization (SMO) phase, known as the Dose-Aware SMO. With a few realistic test cases we demonstrate the capability of Dose-Aware SMO in terms of improving EUV throughput via reducing the effective exposure time, in both regular and obscured projection systems. The physical dose modeling capability in computational lithography not only addresses those immediate challenges emergent from EUV throughput, but also opens the gate towards a broad class of exciting topics that are built upon physical dose, such as optical stochastic phenomena and so on.
Over the years, lithography engineers have continued to focus on CD control, overlay and process capability to meet node requirements for yield and device performance. Previous work by Fukuda1 developed a multi-exposure technique at multi-focus positions to image contact holes with adequate DOF. Lalovic2 demonstrated a fixed 2-wavelength technique to improve DOF called RELAX. The concept of multi-focal imaging (MFI) was introduced3 demonstrating two focal positions are created that are averaged over the exposure field, this wavelength “dithering” approach which can be turned on and off, thus eliminating any potential scanner calibration issues.
In this work, the application of this imaging method (1 exposure-2 focus positions) can be used in thick photoresist and high aspect ratio applications. An example of thick photoresist imaging is shown in figure 1. We demonstrate 5um line and space features in 10um of photoresist at 3 different imaging conditions. On the left, single focus imaging (SFI) at best dose and focus, the center image which is also SFI but at a defocus of +3.2um. On the right is MFI with 2 focus positions of 0 and 2.8um. Here we can see a significant improvement in the SWA linearity and image profile quality. A second example of high aspect ratio imaging using MFI is shown in figure 2. The aspect ratio of 13:1 is shown for this. The use of Tachyon KrF MFI source – mask optimization flow will be reviewed to demonstrate optimum conditions to achieve Customer required imaging to meet specific layer requirements.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.