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Kumar Shubham
at IIT(BHU)
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Publications (1)
Proceedings Article | 28 January 2013 Paper
Fabrication and electrical characterization of Pd/TiO2/n-Si MIS structure using TiO2 film as insulator layer deposited by low temperature arc vapor deposition process
Proceedings Volume 8760, 876007 (2013) https://doi.org/10.1117/12.2009612
KEYWORDS: Dielectrics, Thin films, Oxides, Annealing, Capacitance, Interfaces, Silicon, Metals, Deposition processes, Titanium dioxide
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