Paper
19 September 2018 CK-MASK semi-manual tool for mask inspection and blowing
Author Affiliations +
Proceedings Volume 10775, 34th European Mask and Lithography Conference; 107750E (2018) https://doi.org/10.1117/12.2326607
Event: 34th European Mask and Lithography Conference, 2018, Grenoble, France
Abstract
Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratches, fingerprints, pellicle damage... All these potential issues arise during the mask certification process causing mask repelliculization, and, in the worst case, mask scrap with drawbacks linked to production aspects: quality (repetitive defects), cost (mask repels/remake), production lots on hold, non-linear production WIP and non-respect of production commitments. AG8-AGM photolithography engineering team in collaboration with “Gusmini attrezzature industriali” developed a tool called “CK-MASK” able to handle 6” masks and to reduce the risks connected to masks inspection and blowing.
© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrea Leserri, Francesco Ferrario, Umberto Iessi, and Andrea Gusmini "CK-MASK semi-manual tool for mask inspection and blowing", Proc. SPIE 10775, 34th European Mask and Lithography Conference, 107750E (19 September 2018); https://doi.org/10.1117/12.2326607
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Inspection

Particles

Pellicles

Contamination

Lithography

Optical inspection

Back to Top