Presentation + Paper
4 March 2022 Modifications to a high-precision direct laser writing setup to improve its laser microfabrication
Author Affiliations +
Abstract
Two-photon-absorption (2PA) techniques enables the possibility to create extremely fine structures in photosensitive materials. For direct laser writing as micro- or nanofabrication a laser system can be combined with highly precise positioning systems. These are mostly limited by a few hundreds micrometer positioning range with applications based on piezoelectric stages or even just relatively few tens micrometer positioning range with applications based on galvanometer scanners. Although these techniques are precise, but stitching methods are required for larger fabrication areas. Therefore, a setup consisting of a femtosecond laser for 2PA and a nanopositioning and nanomeasuring machine (NMM-1) was developed for high precision laser writing on lager surfaces. Further developments of the system should enable a significant improvement in high-precision and stitching free direct laser writing. In order to combine the the femtosecond laser and the NMM-1 into a functional unit, to write complex structures with highest accuracy and homogeneity, further improvements like a beam expansion for a better use of the numerical aperture of the objective and a new femtosecond laser with a integrated power measurement are realized. This showed improvements in line width for nano strucuring. Advantages and disadvantages as well as further developments of the NMM-1 system will be discussed related to current developments in the laser beam and nanopositioning system optimization.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Annika-Verena Häcker, Laura Mohr-Weidenfeller, Clara F. L. Stolzenberg, Carsten Reinhardt, and Eberhard Manske "Modifications to a high-precision direct laser writing setup to improve its laser microfabrication", Proc. SPIE 11989, Laser-based Micro- and Nanoprocessing XVI, 119890U (4 March 2022); https://doi.org/10.1117/12.2609417
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KEYWORDS
Multiphoton lithography

Photons

Femtosecond phenomena

Absorption

Beam expanders

Photosensitive materials

Lithography

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