Clara F. L. Stolzenberg
at Technische Univ Ilmenau
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 4 March 2022 Presentation + Paper
Proceedings Volume 11989, 119890U (2022) https://doi.org/10.1117/12.2609417
KEYWORDS: Direct write lithography, Photons, Multiphoton lithography, Femtosecond phenomena, Absorption, Photosensitive materials, Beam expanders, Lithography

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top