Photoresist as a recording material for holographic elements

Miroslav Miler

doi:10.1117/12.165354

10 December 1993 Photoresist as a recording material for holographic elements

Miroslav Miler

Proceedings Volume 2108, International Conference on Holography, Correlation Optics, and Recording Materials; (1993) https://doi.org/10.1117/12.165354
Event: Holography, Correlation Optics, and Recording Materials, 1993, Chernivsti, Ukraine

Abstract

Photoresist, as one of the most important materials for recording holographic diffraction structures, is treated particularly from the point of view of a control of the development of the surface-relief profile of the grating groove. Primary attention is given to the formation of the desirable profile for the grating multiple beam splitter.

Citation Download Citation

Miroslav Miler "Photoresist as a recording material for holographic elements", Proc. SPIE 2108, International Conference on Holography, Correlation Optics, and Recording Materials, (10 December 1993); https://doi.org/10.1117/12.165354

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