Extended chamber matching and repeatability study for chrome etch

Yi-Chiau Huang; Melisa J. Buie; Brigitte C. Stoehr; Alex H. Buxbaum; Guenther G. Ruhl

doi:10.1117/12.458344

11 March 2002 Extended chamber matching and repeatability study for chrome etch

Yi-Chiau Huang, Melisa J. Buie, Brigitte C. Stoehr, Alex H. Buxbaum, Guenther G. Ruhl

Proceedings Volume 4562, 21st Annual BACUS Symposium on Photomask Technology; (2002) https://doi.org/10.1117/12.458344
Event: Photomask 2001, 2001, Monterey, CA, United States

Abstract

Shrinking design rules, optical proximity correction and advanced phase shifting techniques require new methods of photomask manufacturing. The Applied Materials Centura photomask etch chamber leverages Applied Materials' extensive etch experience to provide an innovative dry etch solution to the mask dry etch challenges for < 0.13 micrometers device generations. Repeatable, consistent, stable etch performance is critical for advanced mask manufacturing. An extended chamber matching and repeatability study for chrome etch found that stable chrome and photoresist etch rates (and therefore selectivities) are produced on the Applied Materials Centura photomask etch chamber. The etch responses are consistent mask to mask as well as chamber to chamber. Prior to the extended study, pumping efficiencies, RF source and bias calibrations and optical emission spectral responses were compared. Since the study was performed at several different sites, the metrology tools were calibrated using masks specifically designed for this purpose. The marathon testing illustrates the stable etch performance over time.

Citation Download Citation

Yi-Chiau Huang, Melisa J. Buie, Brigitte C. Stoehr, Alex H. Buxbaum, and Guenther G. Ruhl "Extended chamber matching and repeatability study for chrome etch", Proc. SPIE 4562, 21st Annual BACUS Symposium on Photomask Technology, (11 March 2002); https://doi.org/10.1117/12.458344

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