Plasma etching of ZnO: a review

Karen J. Nordheden

doi:10.1117/12.531391

6 July 2004 Plasma etching of ZnO: a review

Karen J. Nordheden

Proceedings Volume 5359, Quantum Sensing and Nanophotonic Devices; (2004) https://doi.org/10.1117/12.531391
Event: Integrated Optoelectronic Devices 2004, 2004, San Jose, CA, United States

Abstract

A review of the current literature on plasma etching of ZnO is presented. The etch rates as a function of etch conditions in Cl₂-based BCl₃-based and CH₄-based and related chemistries are reviewed. Resultant surface morphology, anisotropy, surface stoichiometry and band edge photoluminescence results are also discussed.

Citation Download Citation

Karen J. Nordheden "Plasma etching of ZnO: a review", Proc. SPIE 5359, Quantum Sensing and Nanophotonic Devices, (6 July 2004); https://doi.org/10.1117/12.531391

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