Precision shaping of transparent materials for optical devices with VUV laser radiation

Thorsten Temme; Andreas Ostendorf; Christian J. Kulik

doi:10.1117/12.552744

2 April 2004 Precision shaping of transparent materials for optical devices with VUV laser radiation

Thorsten Temme, Andreas Ostendorf, Christian J. Kulik

Proceedings Volume 5399, Laser-Assisted Micro- and Nanotechnologies 2003; (2004) https://doi.org/10.1117/12.552744
Event: Laser-Assisted Micro- and Nanotechnologies 2003, 2003, St. Petersburg, Russian Federation

Abstract

The precision machining of glass by laser ablation has been expanded with the short wavelength of the 157 nm of the F2 excimer laser. The high absorption of this wavelength in any optical glass, especially in UV-grade fused silica, offers a new approach to generate high quality surfaces, addressing also micro-optical components. In this paper, the machining of basic diffractive and refractive optical components and the required machining and process technology is presented. Applications that are addressed are cylindrical and rotational symmetrical micro lenses and diffractive optics like phase transmission grating and diffractive optical elements (DOEs). These optical surfaces have been machined into bulk material as well as on fiber end surfaces, to achieve compact (electro)-optical elements with high functionality and packaging density. The short wavelength of 157 nm used in the investigations require either vacuum or high purity inert gas environments. The influence of different ambient conditions is presented.

Citation Download Citation

Thorsten Temme, Andreas Ostendorf, and Christian J. Kulik "Precision shaping of transparent materials for optical devices with VUV laser radiation", Proc. SPIE 5399, Laser-Assisted Micro- and Nanotechnologies 2003, (2 April 2004); https://doi.org/10.1117/12.552744

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