EUV reflectivity and stability of tri-component Al-based multilayers

E. Meltchakov; A. Ziani; F. Auchere; X. Zhang; M. Roulliay; S. De Rossi; Ch. Bourassin-Bouchet; A. Jérome; F. Bridou; F. Varniere; F. Delmotte

doi:10.1117/12.896577

3 October 2011 EUV reflectivity and stability of tri-component Al-based multilayers

E. Meltchakov, A. Ziani, F. Auchere, X. Zhang, M. Roulliay, S. De Rossi, Ch. Bourassin-Bouchet, A. Jérome, F. Bridou, F. Varniere, F. Delmotte

Author Affiliations +

Proceedings Volume 8168, Advances in Optical Thin Films IV; 816819 (2011) https://doi.org/10.1117/12.896577
Event: SPIE Optical Systems Design, 2011, Marseille, France

Abstract

We report on further development of three-material multilayer coatings made with a use of aluminum for the extreme ultra-violet (EUV) applications such as solar physics, high-order harmonic generation or synchrotron radiation. It was found that an introduction of refractory metal in Al-based periodic stack helps to reduce significantly an interfacial roughness and provides for a higher theoretical reflectance in the spectral range from 17 to 40 nm. The normal incidence reflectivity as high as 55 % at 17 nm, 50 % at 21 nm and 42 % at 30 nm was achieved with the new Al/Mo/SiC and Al/Mo/B₄C multilayer mirrors, which have been optimized, fabricated and characterized with x-rays and synchrotron radiation. A good temporal and thermal stability of the tri-component Al-based multilayers has been observed over 3 years.

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E. Meltchakov, A. Ziani, F. Auchere, X. Zhang, M. Roulliay, S. De Rossi, Ch. Bourassin-Bouchet, A. Jérome, F. Bridou, F. Varniere, and F. Delmotte "EUV reflectivity and stability of tri-component Al-based multilayers", Proc. SPIE 8168, Advances in Optical Thin Films IV, 816819 (3 October 2011); https://doi.org/10.1117/12.896577

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