Dr. Françoise Bridou Profile

Dr. Françoise Bridou

Research Engineer at Institut d'Optique Graduate School

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Author

Publications (20)

SPIE Journal Paper | 17 November 2017 Open Access

Study of Cr/Sc-based multilayer reflecting mirrors using soft x-ray reflectivity and standing wave-enhanced x-ray fluorescence (Erratum)

Meiyi Wu, Catherine Burcklen, Jean-Michel André, Karine Le Guen, Angelo Giglia, Konstantin Koshmak, Stefano Nannarone, Françoise Bridou, Evgueni Meltchakov, Sébastien de Rossi, Franck Delmotte, Philippe Jonnard

OE, Vol. 56, Issue 11, 119801, (November 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.11.119801

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SPIE Journal Paper | 1 November 2017

Study of Cr/Sc-based multilayer reflecting mirrors using soft x-ray reflectivity and standing wave-enhanced x-ray fluorescence

OE, Vol. 56, Issue 11, 117101, (November 2017) https://doi.org/10.1117/12.10.1117/1.OE.56.11.117101

KEYWORDS: Reflectivity, Mirrors, X-rays, X-ray fluorescence spectroscopy, Interfaces, Chromium, Multilayers, Sputter deposition, Sensors, Luminescence

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Proceedings Article | 26 September 2013 Paper

Development of multilayer coatings for solar orbiter EUV imaging telescopes

Franck Delmotte, Evgueni Meltchakov, Sébastien de Rossi, Françoise Bridou, Arnaud Jérome, François Varnière, Raymond Mercier, Frédéric Auchère, Xueyan Zhang, Bruno Borgo, Cydalise Dumesnil, Serge François, Marc Roulliay, Udo Strauch

Proceedings Volume 8862, 88620A (2013) https://doi.org/10.1117/12.2036050

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Telescopes, Space telescopes, Synchrotrons, Aluminum, Mirrors, Deposition processes, Space operations

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Proceedings Article | 5 October 2011 Paper

Aluminum based multilayers systems synthesized by ion beam sputtering for extreme UV

A. Ziani, F. Delmotte, C. Le Paven-Thivet, E. Meltchakov, F. Bridou, A. Jérome, M. Roulliay, K. Gasc

Proceedings Volume 8168, 81681S (2011) https://doi.org/10.1117/12.896433

KEYWORDS: Reflectivity, Aluminum, Ion beams, Mirrors, Sputter deposition, Multilayers, Extreme ultraviolet, Reflectometry, Ultraviolet radiation, X-rays

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Proceedings Article | 4 October 2011 Paper

EUV reflectivity and stability of tri-component Al-based multilayers

E. Meltchakov, A. Ziani, F. Auchere, X. Zhang, M. Roulliay, S. De Rossi, Ch. Bourassin-Bouchet, A. Jérome, F. Bridou, F. Varniere, F. Delmotte

Proceedings Volume 8168, 816819 (2011) https://doi.org/10.1117/12.896577

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet, Aluminum, Silicon carbide, Silicon, X-rays, Interfaces, Synchrotron radiation, Temperature metrology

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Proceedings Article | 28 September 2011 Paper

Development of supermirrors for high-resolution x-ray LMJ microscopes

Ph. Troussel, D. Dennetiere, R. Rosch, C. Reverdin, H. Hartmann, F. Bridou, E. Meltchakov, F. Delmotte

Proceedings Volume 8139, 81390C (2011) https://doi.org/10.1117/12.895944

KEYWORDS: Microscopes, Mirrors, Reflectivity, X-rays, X-ray imaging, Multilayers, Spatial resolution, Grazing incidence, Diagnostics, Imaging systems

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Proceedings Article | 18 February 2011 Paper

EUV multilayer optics for space science and ultrafast science

F. Delmotte, S. de Rossi, C. Bourassin-Bouchet, E. Meltchakov, A. Ziani, F. Choueikani, F. Bridou, A. Jérome, F. Varnière

Proceedings Volume 7995, 79952Q (2011) https://doi.org/10.1117/12.888199

KEYWORDS: Multilayers, Extreme ultraviolet, Reflectivity, Mirrors, Thin films, Silicon, EUV optics, X-rays, Molybdenum, Sputter deposition

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Proceedings Article | 12 October 2007 Paper

Characterization of an OFI seeded soft x-ray laser

Ph. Zeitoun, S. Sebban, J. Goddet, F. Bridou, F. Burgy, B. Cros, D. Douillet, J. Gautier, O. Guillbaud, G. Jamelot, D. Joyeux, S. Kazamias, A. Klisnick, G. Maynard, A. Morlens, D. Phalippou, T. Lefrou, D. Ros, J. Rousseau

Proceedings Volume 6702, 670209 (2007) https://doi.org/10.1117/12.731002

KEYWORDS: X-ray lasers, Wavefronts, Spatial coherence, Spectroscopy, Visibility, Mirrors, Amplifiers, X-rays, Interferometers, Spatial filters

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Proceedings Article | 20 September 2007 Paper

XUV optics for attosecond applications

J. Gautier, A. S. Morlens, P. Zeitoun, G. Rey, C. Valentin, E. Papalarazou, J. P. Goddet, S. Sebban, F. Delmotte, M. F. Ravet, F. Bridou

Proceedings Volume 6705, 67050C (2007) https://doi.org/10.1117/12.732424

KEYWORDS: Mirrors, Reflectivity, Holography, Holograms, Multilayers, Silicon, Extreme ultraviolet, Microscopy, Digital holography, X-rays

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Proceedings Article | 18 May 2007 Paper

Design, conception, and metrology of EUV mirrors for aggressive environments

Christophe Hecquet, Marie-Françoise Ravet-Krill, Franck Delmotte, Arnaud Jérôme, Aurélie Hardouin, Françoise Bridou, Françoise Varnière, Marc Roulliay, Frédéric Bourcier, Jean-Michel Desmarres, Vincent Costes, Jacques Berthon, André Rinchet, Roland Geyl

Proceedings Volume 6586, 65860X (2007) https://doi.org/10.1117/12.723483

KEYWORDS: Reflectivity, Extreme ultraviolet, Multilayers, Extreme ultraviolet lithography, Humidity, Annealing, Reflectometry, Silicon carbide, Silicon, Space operations

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The development of new high power EUV sources and EUV space imaging requires optics having specific properties which depend on applications and operating conditions. These both applications are very different in the working multilayers environment. For the high power sources, multilayers are submitted to short pulses with high energy peak whereas, for the space imaging, multilayers are submitted to continuous flux with low level. Moreover photon energy and environment for both applications may be different. The environment may affect structure and top layer contamination when optics are stored, handled, mounted on the final device and finally operating. Main environmental parameters investigated are temperature and humidity variation. One objective is the optimisation of multilayer coatings to offer the highest resistance under photonic, ionic fluxes and temperature cycle. This means that interfacial diffusion between thin layers and degradation of the capping layers have to be avoided or reduced. The present study relies with designing, depositing and testing different structures of multilayer coatings in order to minimise the influence of the environment. Multilayer coatings based on molybdenum, silicon and silicon carbide materials have been deposited by magnetron sputtering on silicon and zerodur substrates. Samples were submitted to radiations emitted by an EUV source at wavelength closed to 13.5 nm. Furthermore they were also submitted to thermal cycles and annealing under warm humidity in the aim to simulate extremes storage or handling conditions as space mission's conditions. The damages and the performance of the multilayers were evaluated by using grazing incidence reflectometry at 0.154 nm and EUV reflectometry at the operating wavelength. After a presentation of the multilayer design, deposition and metrology tools, we will describe the different environmental effects on the coatings to take in care during EUV source exposure, handling and storage conditions. First results on multilayers performances to EUV source exposure and space specification tests are presented. Main damages studies were on annealing, thermal cycling and warm humidity.

Proceedings Article | 5 October 2005 Paper

B4C/Mo/Si multilayers for 20–40 nm wavelengths: application to broadband mirrors

Franck Delmotte, Julien Gautier, Marc Roulliay, Marie Francoise Ravet, Francoise Bridou, Arnaud Jerome

Proceedings Volume 5963, 59631V (2005) https://doi.org/10.1117/12.625031

KEYWORDS: Reflectivity, Mirrors, Multilayers, Silicon, Molybdenum, Sputter deposition, Calibration, Superposition, Extreme ultraviolet, Ion beams

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Proceedings Article | 5 October 2005 Paper

Determination of complex optical indices in the 80-140nm VUV wavelength region from reflectivity measurements under normal incidence: application to ZnSe

F. Bridou, M. Cuniot-Ponsard, J. M. Desvignes

Proceedings Volume 5963, 59631S (2005) https://doi.org/10.1117/12.624848

KEYWORDS: Reflectivity, Aluminum, Vacuum ultraviolet, Mirrors, Thin films, Solar energy, Absorption, X-ray diffraction, Reflectometry, Solar processes

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Proceedings Article | 5 October 2005 Paper

Performances and stability of Sc/Si multilayers with barrier layers for wavelengths around 46 nm

Julien Gautier, Franck Delmotte, Marc Roulliay, Marie-Francoise Ravet, Francoise Bridou, Arnaud Jerome, Angelo Giglia, Stefano Nannarone

Proceedings Volume 5963, 59630X (2005) https://doi.org/10.1117/12.625030

KEYWORDS: Reflectivity, Annealing, Multilayers, Reflectometry, Silicon, Sputter deposition, Argon, X-rays, Extreme ultraviolet, Scandium

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Proceedings Article | 5 October 2005 Paper

X-UV chirped mirror fabrication for phase control of attosecond pulses

Anne-Sophie Morlens, Marie-Françoise Ravet, Vincent Laude, Rodrigo López-Martens, Marc Roulliay, Arnaud Jérome, Franck Delmotte, Françoise Bridou, Sophie Kazamias, Philippe Balcou, Philippe Zeitoun

Proceedings Volume 5963, 59630W (2005) https://doi.org/10.1117/12.625097

KEYWORDS: Mirrors, Reflectivity, Silicon, Molybdenum, Multilayers, Extreme ultraviolet, Calibration, Reflectometry, Neon, Control systems

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Proceedings Article | 25 February 2004 Paper

VUV mirrors for the (80-120 nm) spectral range

Francoise Bridou, Mireille Cuniot-Ponsard, Jean-Michel Desvignes, Ivan Maksimovic, Philippe Lemaire

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.514441

KEYWORDS: Reflectivity, Aluminum, Mirrors, Thin films, Solar processes, Vacuum ultraviolet, Laser induced fluorescence, Refractive index, Solar energy, Coronagraphy

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Proceedings Article | 25 February 2004 Paper

Ion-beam-deposited Mo/Si multilayers for EUV imaging applications in astrophysics

Marie-Francoise Ravet, Francoise Bridou, Xueyan Zhang-Song, Arnaud Jerome, Franck Delmotte, Raymond Mercier, Marie Bougnet, Philippe Bouyries, Jean-Pierre Delaboudiniere

Proceedings Volume 5250, (2004) https://doi.org/10.1117/12.514597

KEYWORDS: Reflectivity, Multilayers, Telescopes, Mirrors, Calibration, Extreme ultraviolet, Reflectometry, Ion beams, Silicon, Reflector telescopes

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Proceedings Article | 4 February 2004 Paper

EUVI: the STEREO-SECCHI extreme ultraviolet imager

Jean-Pierre Wuelser, James Lemen, Theodore Tarbell, C. Wolfson, Joseph Cannon, Brock Carpenter, Dexter Duncan, Glenn Gradwohl, Syndie Meyer, Augustus Moore, Rosemarie Navarro, J. Pearson, George Rossi, Larry Springer, Russell Howard, John Moses, Jeffrey Newmark, Jean-Pierre Delaboudiniere, Guy Artzner, Frederic Auchere, Marie Bougnet, Philippe Bouyries, Francoise Bridou, Jean-Yves Clotaire, Gerard Colas, Franck Delmotte, Arnaud Jerome, Michel Lamare, Raymond Mercier, Michel Mullot, Marie-Francoise Ravet, Xueyan Song, Volker Bothmer, Werner Deutsch

Proceedings Volume 5171, (2004) https://doi.org/10.1117/12.506877

KEYWORDS: Mirrors, Telescopes, Space telescopes, Extreme ultraviolet, Charge-coupled devices, Optical filters, Calibration, Coating, Observatories, Sensors

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Proceedings Article | 4 November 1994 Paper

Application of the Fourier transform in a preliminary analysis of the reflectivity curve obtained by grazing x-ray reflectometry

Francoise Bridou, Bruno Pardo

Proceedings Volume 2253, (1994) https://doi.org/10.1117/12.192143

KEYWORDS: Reflectivity, Fourier transforms, X-rays, Reflectometry, Error analysis, Correlation function, Data modeling, Absorption, Interfaces, Scattering

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Proceedings Article | 23 November 1992 Paper

High-performance neutron supermirrors deposited using an automatic accurate-thickness monitoring technique

Claude Sella, Malik Maaza, Mustapha Kaabouchi, Bruno Pardo, Francoise Bridou, Monique Miloche

Proceedings Volume 1738, (1992) https://doi.org/10.1117/12.130628

KEYWORDS: Reflectivity, Nickel, Titanium, Sputter deposition, Multilayers, Monochromators, Reflectometry, X-rays, Optical components, Scattering

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Proceedings Article | 23 November 1992 Paper

Thermal stability of [Ni-Ti] multilayers

Malik Maaza, Claude Sella, Mustapha Kaabouchi, Jean Pierre Ambroise, Bruno Pardo, Francoise Bridou, Monique Miloche, Frantz Wehling, Michel Groos, Gloria Foulet, Hacene Lasri, Ramanthan Krishnan

Proceedings Volume 1738, (1992) https://doi.org/10.1117/12.130618

KEYWORDS: Diffusion, Nickel, Reflectivity, Annealing, Interfaces, Scattering, Temperature metrology, Optical components, Modulation, Ions

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Showing 5 of 20 publications

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