Dr. Akihiro Oshima
at Osaka Univ
SPIE Involvement:
Author
Publications (23)

Proceedings Article | 27 March 2018 Presentation + Paper
Proceedings Volume 10583, 105831M (2018) https://doi.org/10.1117/12.2297370
KEYWORDS: Ultraviolet radiation, Extreme ultraviolet lithography, Extreme ultraviolet, Absorbance, Optical lithography, Absorption, Line edge roughness, Picosecond phenomena, Chemically amplified resists, Image processing

Proceedings Article | 27 March 2018 Presentation + Paper
Seiji Nagahara, Michael Carcasi, Gosuke Shiraishi, Yuya Kamei, Kathleen Nafus, Yukie Minekawa, Hiroyuki Ide, Yoshihiro Kondo, Takahiro Shiozawa, Keisuke Yoshida, Masashi Enomoto, Kosuke Yoshihara, Hideo Nakashima, Serge Biesemans, Ryo Shimada, Masaru Tomono, Kazuhiro Takeshita, Teruhiko Moriya, Hayakawa Makoto, Ryo Aizawa, Yoshitaka Konishi, Masafumi Hori, Ken Maruyama, Hisashi Nakagawa, Masayuki Miyake, Tomoki Nagai, Satoshi Dei, Takehiko Naruoka, Motoyuki Shima, Toru Kimura, Geert Vandenberghe, John Petersen, Danilo De Simone, Foubert Philippe, Hans-Jürgen Stock, Balint Meliorisz, Akihiro Oshima, Seiichi Tagawa
Proceedings Volume 10586, 1058606 (2018) https://doi.org/10.1117/12.2297498
KEYWORDS: Ultraviolet radiation, Floods, Picosecond phenomena, Extreme ultraviolet lithography, Calibration, Extreme ultraviolet, Chemically amplified resists, Polymers, Image enhancement, Absorption

Proceedings Article | 27 March 2017 Paper
Proceedings Volume 10143, 1014329 (2017) https://doi.org/10.1117/12.2258166
KEYWORDS: Chemistry, Extreme ultraviolet lithography, Extreme ultraviolet, Line edge roughness, Lithography, Chemically amplified resists, Industrial chemicals, Floods, Light sources, Polymers, Picosecond phenomena, Ultraviolet radiation, Chemical reactions, Absorption

Proceedings Article | 27 March 2017 Presentation + Paper
Proceedings Volume 10146, 101460G (2017) https://doi.org/10.1117/12.2258217
KEYWORDS: Extreme ultraviolet lithography, Chemically amplified resists, Floods, Lithography, Extreme ultraviolet, Line edge roughness, Image processing, Image enhancement, Ultraviolet radiation, Scanners, Picosecond phenomena, Polymers, Line width roughness, Stochastic processes

SPIE Journal Paper | 15 July 2016
JM3, Vol. 15, Issue 03, 033502, (July 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.3.033502
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

Showing 5 of 23 publications
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