Design and preliminary numerical simulations of D-band planar microstrip meander-line slow wave structure for lowvoltage tubes with sheet electron beam were carried out. An original approach based on magnetron sputtering and laser ablation methods was utilized for microstrip meander-line slow wave structure microfarication. An application of nanosecond and picosecond laser ablation for microfabrication of D-band (110-170 GHz) planar microstrip meander-line slow wave structure was considered. We have verified our original approach for planar slow wave structures microfabrication by using different CNC precision laser machines operating with different values of laser pulse duration (100 ns, 8 ns, 4 ns and 10 ps). Samples of slow wave structures were fabricated and characterized by scanning electron microscopy and profilometry methods. It was shown that each considered CNC precision laser machine allows fabricating D-band microstrip meander-line slow wave structure with required dimensions, but picosecond laser ablation has such advantages as the absence of ablation products (droplets, and etc.) on the slow wave structure surface. As the next step, we are going to study S-parameters of microfabricated D-band microstrip meander-line slow wave structure samples experimentally by using vector network analyzer with D-band frequency converters.
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