Dr. Arndt Christian Duerr Profile

Dr. Arndt Christian Duerr

at Advanced Mask Technology Ctr

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 16 November 2007 Paper

Use of layout automation and design-based metrology for defect test mask design and verification

Chris Spence, Cyrus Tabery, Andre Poock, Arndt Duerr, Thomas Witte, Jan Fiebig, Jan Heumann

Proceedings Volume 6730, 67300P (2007) https://doi.org/10.1117/12.746953

KEYWORDS: Photomasks, Semiconducting wafers, Inspection, Reticles, Optical proximity correction, Metrology, Environmental sensing, Wafer inspection, Critical dimension metrology, Defect detection

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Proceedings Article | 3 May 2007 Paper

Programmed defects study on masks for 45nm immersion lithography using the novel AIMS 45-193i

Thomas Scherübl, Arndt Dürr, Klaus Böhm, Robert Birkner, Rigo Richter, Ulrich Strößner

Proceedings Volume 6533, 653309 (2007) https://doi.org/10.1117/12.736530

KEYWORDS: Photomasks, Scanners, Immersion lithography, Lithographic illumination, Opacity, Defect detection, Lithography, CCD cameras, Semiconducting wafers, Manufacturing

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Proceedings Article | 20 October 2006 Paper

Inspectability and printability of lines and spaces halftone masks for the advanced DRAM node

Arndt Dürr, Karsten Gutjahr, Jan Heumann, Martin Stengl, Frank Katzwinkel, Andreas Frangen, Thomas Witte

Proceedings Volume 6349, 63493O (2006) https://doi.org/10.1117/12.693061

KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Printing, Scanning electron microscopy, Critical dimension metrology, Manufacturing, Halftones, Solids

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Proceedings Article | 20 October 2006 Paper

Limitations of optical reticle inspection for 45-nm node and beyond

S. Teuber, A. Bzdurek, A. Dürr, J. Heumann, C. Holfeld

Proceedings Volume 6349, 63490T (2006) https://doi.org/10.1117/12.686078

KEYWORDS: Inspection, Photomasks, Image transmission, Reticles, Printing, Optical inspection, Defect detection, Optical lithography, Semiconducting wafers, Defect inspection

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Proceedings Article | 20 May 2006 Paper

Automated evaluation of AIMS images: an approach to minimize evaluation variability

Arndt Dürr, Martin Arndt, Jan Fiebig, Samuel Weiss

Proceedings Volume 6283, 62832A (2006) https://doi.org/10.1117/12.681781

KEYWORDS: Photomasks, Image processing, Reliability, Image analysis, Environmental sensing, MATLAB, Image quality, Algorithm development, Printing, Airborne remote sensing

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Proceedings Article | 24 March 2006 Paper

An advanced study for defect disposition through 193-nm aerial imaging

Arndt Dürr, Axel Zibold, Klaus Böhm

Proceedings Volume 6152, 61522M (2006) https://doi.org/10.1117/12.657622

KEYWORDS: Photomasks, Metrology, Halftones, Airborne remote sensing, Printing, Semiconducting wafers, Beam homogenizers, Reticles, Inspection, Optical simulations

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Proceedings Article | 23 March 2006 Paper

Influence of mask manufacturing process on printing behavior of angled line structures

Silvio Teuber, Arndt Dürr, Holger Herguth, Gerhard Kunkel, Timo Wandel, Thomas Zell

Proceedings Volume 6154, 61544C (2006) https://doi.org/10.1117/12.657070

KEYWORDS: Photomasks, Line edge roughness, Line width roughness, Printing, Semiconducting wafers, Critical dimension metrology, Scanning electron microscopy, Manufacturing, Electron beams, Inspection

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Proceedings Article | 8 November 2005 Paper

The importance of being homogeneous: on the influence of illumination inhomogeneity on AIMS images

Arndt Dürr, Karsten Bubke, Martin Sczyrba, Samuel Angonin

Proceedings Volume 5992, 59922Y (2005) https://doi.org/10.1117/12.632098

KEYWORDS: Photomasks, Diffraction, Computer simulations, Printing, Semiconducting wafers, Solids, Image processing, Lithographic illumination, 193nm lithography, Data modeling

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Proceedings Article | 28 June 2005 Paper

Aerial image based mask defect detection in dense array structures

Roderick Kohle, Mario Hennig, Rainer Pforr, Karsten Bubke, Martin Sczyrba, Arndt Durr

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617303

KEYWORDS: Photomasks, Printing, Semiconducting wafers, Inspection, Defect detection, Imaging arrays, Diffraction gratings, Diffraction, Microscopes, Optical filters

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Proceedings Article | 16 June 2005 Paper

Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements

Axel Zibold, Rainer Schmid, Klaus Bohm, Robert Brunner, Arndt Durr

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637309

KEYWORDS: Photomasks, Image resolution, Semiconducting wafers, Lithography, Reticles, Binary data, Optical proximity correction, 193nm lithography, Airborne remote sensing, Scanners

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Proceedings Article | 16 June 2005 Paper

Defect printability and inspectability of halftone masks for the 90nm and 70nm node

Karin Eggers, Karsten Gutjahr, Milko Peikert, Dieter Rutzinger, Ralf Ludwig, Michael Kaiser, Arndt Durr, Jan Heumann

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637328

KEYWORDS: Inspection, Photomasks, Semiconducting wafers, Printing, Defect detection, Defect inspection, Halftones, Scanning electron microscopy, Critical dimension metrology, Reflectivity

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Showing 5 of 11 publications

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