We have demonstrated silicone-incorporated organic light-emitting semiconductor (SI-OLES) enabling anisotropic micro-lithography with reactive ion etching (RIE)-coupled photolithography (RCP) process. The SI-OLES possesses high chemical–physical robustness, and particularly, can render silicone-based non-blocking etching layer during the RIE by mimicking RIE chemistry of silicon, so that precise anisotropic mciro-patterns of SI-OLES can be achieved by the RCP process. Consequently, we successfully fabricated ultrahigh-density RGB OLES anisotropic patterns (4,216 ppi corresponding to 4,938,271 patterns/cm2), as well as, full-color SI-OLES-based OLEDs (949 ppi) without degradation of their electroluminescence characteristics, by the application of three cycles of consecutive RCP processes.
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