In this work we explain the methodology and techniques for building an end-to-end design enablement (DE) platform from component design to process design kit (PDK) release for silicon photonics-based photonic integrated circuit (PIC) design. Elements of the DE include: component design, layout and test site development, measurement infrastructure and PDK development. Our methodology builds on the best practices followed in CMOS and RF foundries but adds unique features specific to silicon photonics. The DE flow is developed on the American Institute for Manufacturing Integrated Photonics’ (AIM Photonics) 300 mm silicon photonic technologies manufactured in a limited-volume foundry at the Albany Nanotech Complex, in Albany, NY. For component development, the AIM Photonics PDK offers a process stack file supported in Lumerical platform that applies linewidth corrections and doping information to imported layouts increasing the efficiency and accuracy of the design. For test sites, an automated layout and connectivity framework is explained that allows users to generate a layout from spreadsheet inputs that is also compatible with automated waferscale measurements. AIM Photonics PDKs include layout, models and design-rule-check (DRC) tools that are offered across multiple platforms. The DRC decks are offered in commercial tools such as Cadence and Synopsys, as well as KLayout. We present features of layouts and communication with schematics. In addition, we also explain techniques for processing and analyzing measured statistical data and extracting platform specific compact models. Presenting this methodology to the wider community is integral to the mission of AIM Photonics and will be of immense benefit particularly to small organizations engaged in prototype development.
A novel process design kit (PDK) offering providing seamless access to the Albany NanoTech Complex’s 300mm foundry with a mission to promote silicon photonics technology is demonstrated. Unlike traditional pure-play foundries, we have developed a framework that allows our PDKs to contain libraries developed by internal and external domain experts. In addition to integrated Electronic Photonic Design Automation (EPDA) platforms, our PDK is also released in an alternate PIC design flow that the lowers the cost barrier for organizations. Further, our PDKs target a broad application space that includes telecom as well emerging areas such as sensors and quantum photonics – all with the ability for onboard light sources. A PDK from American Institute of Manufacturing (AIM Photonics) will be discussed that demonstrates these features.
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