Dr. Daniel E. Falvey Profile

Dr. Daniel E. Falvey

at Univ of Maryland College Park

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Author

Publications (4)

Proceedings Article | 10 April 2024 Presentation

Multicolor lithography, a promising approach to large-area nanopatterning

Sandra Gutierrez Razo, Nikolaos Liaros, Nicholas Fisher, Andrea Zeppuhar, Mona Abostate, John Petersen, Daniel Falvey, Amy Mullin, John Fourkas

Proceedings Volume PC12956, PC129560H (2024) https://doi.org/10.1117/12.3010932

KEYWORDS: Lithography, Nanostructures, Wafer-level optics, Vacuum, Semiconducting wafers, Photoresist materials, Optical lithography, Near ultraviolet, Materials properties, Light sources

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Proceedings Article | 10 April 2024 Poster

Three-color lithography for high resolution fabrication

Nicholas Fisher, Shuhei Yamaguchi, Sandra Gutierrez Razo, Nikolaos Liaros, Andrea Zeppuhar, Daniel Falvey, John Petersen, John Fourkas

Proceedings Volume PC12956, PC129560Z (2024) https://doi.org/10.1117/12.3010863

KEYWORDS: Photoresist materials, Lithography, Polymerization, Extreme ultraviolet lithography, Visible radiation, Vacuum, Nanostructures, EUV optics, Beam path, Beam diameter

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Proceedings Article | 19 March 2018 Paper

The state of the art in multicolor visible photolithography

Nikolaos Liaros, Zuleykhan Tomova, Sandra Gutierrez Razo, Samuel Cohen, John Fourkas, Steven Wolf, Matthew Thum, Daniel Falvey, Hannah Ogden, Amy Mullin, Adam Pranda, Gottlieb Oehrlein, John Petersen

Proceedings Volume 10584, 1058407 (2018) https://doi.org/10.1117/12.2297653

KEYWORDS: Photoresist materials, Optical lithography, Lithography, Thin films, Absorption, Molecules, Microscopy, Stimulated emission depletion microscopy, Etching, Point spread functions

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Proceedings Article | 19 March 2018 Paper

Thin films for high-resolution, 3-color lithography

Sandra Gutierrez Razo, Adam Pranda, Nikolaos Liaros, Samuel Cohen, John Fourkas, Gottlieb Oehrlein, Hannah Ogden, Amy Mullin, Steven Wolf, Daniel Falvey, John Petersen

Proceedings Volume 10584, 1058418 (2018) https://doi.org/10.1117/12.2299681

KEYWORDS: Visible radiation, Thin films, Lithography, Semiconducting wafers, Photoresist materials, Silicon, Etching, Optical lithography, Resistance, Plasma

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