Dr. Elizabeth A. Dobisz Profile

Dr. Elizabeth A. Dobisz

Project Scientist at SLAC

SPIE Involvement:

Conference Program Committee | Editor | Author

SPIE Journal Paper | 7 August 2012

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Thomas Albrecht, Paul Nealey

JM3, Vol. 11, Issue 3, 031405, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031405

KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Line-frequency doubling of directed self-assembly patterns for single-digit bit pattern media lithography

K. Patel, R. Ruiz, J. Lille, L. Wan, E. Dobiz, H. Gao, N. Robertson, T. Albrecht

Proceedings Volume 8323, 83230U (2012) https://doi.org/10.1117/12.916589

KEYWORDS: Lithography, Double patterning technology, Etching, Chromium, Optical lithography, Silicon, Reactive ion etching, Plasma, Beam propagation method, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography

Lei Wan, Ricardo Ruiz, He Gao, Kanaiyalal Patel, Jeffery Lille, Gabriel Zeltzer, Elizabeth Dobisz, Alexei Bogdanov, Paul Nealey, Thomas Albrecht

Proceedings Volume 8323, 832319 (2012) https://doi.org/10.1117/12.916592

KEYWORDS: Reactive ion etching, Nanoimprint lithography, Chromium, Lithography, Electron beam lithography, Oxygen, Silicon, Magnetism, Double patterning technology, Directed self assembly

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Proceedings Article | 14 October 2011 Paper

Imprint lithography template technology for bit patterned media (BPM)

J. Lille, K. Patel, R. Ruiz, T.-W. Wu, H. Gao, Lei Wan, G. Zeltzer, E. Dobisz, T. Albrecht

Proceedings Volume 8166, 816626 (2011) https://doi.org/10.1117/12.898785

KEYWORDS: Beam propagation method, Etching, Magnetism, Lithography, Silicon, Head, Electron beam lithography, Oxides, Sensors, Scanning electron microscopy

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SPIE Journal Paper | 1 January 2011 Open Access

Special Section Guest Editorial: Nanoengineering: Fabrication, Properties, Optics, and Devices

Elizabeth Dobisz, Louay Eldada

JNP, Vol. 5, Issue 01, 051799, (January 2011) https://doi.org/10.1117/12.10.1117/1.3599910

KEYWORDS: Nanoengineering, Nanolithography, Solar energy, Integrated optics, Wind energy, Glasses, Data storage, Sensors, System on a chip, Photonics

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Proceedings Article | 27 May 1996 Paper

Process latitude for 100-nm dimensions for e-beam lithography in SAL-601

Elizabeth Dobisz, Christie Marrian

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240491

KEYWORDS: Monte Carlo methods, Electron beam lithography, Lithography, Polymethylmethacrylate, Diffusion, Electrons, Semiconducting wafers, Backscatter, Point spread functions, Photoresist processing

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Proceedings Article | 13 May 1994 Paper

Reactive-ion etching of tungsten for high-resolution x-ray masks

Loretta Shirey, Kelly Foster, William Chu, John Kosakowski, Kee Rhee, Elizabeth Dobisz, Charles Eddy, D. Park, I. Peter Isaacson, Daniel McCarthy, Christie Marrian, Martin Peckerar

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175802

KEYWORDS: Etching, Chromium, Tungsten, Reactive ion etching, Photomasks, Reflectivity, X-rays, Electron beam lithography, Chemistry, Dry etching

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Proceedings Article | 13 May 1994 Paper

Comparison of dry-etch approaches for tungsten patterning

Elizabeth Dobisz, Charles Eddy, John Kosakowski, Orest Glembocki, Loretta Shirey, Kelly Foster, William Chu, Kee Rhee, D. Park, Christie Marrian, Martin Peckerar

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175803

KEYWORDS: Etching, Reactive ion etching, Photomasks, Chemistry, Chromium, Ions, Argon, X-rays, Optical lithography, Electron beam lithography

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Proceedings Article | 3 October 1993 Paper

Low voltage E-beam lithography with the STM

Christie Marrian, Elizabeth Dobisz, John Dagata

Proceedings Volume 10310, 1031005 (1993) https://doi.org/10.1117/12.183196

SPIE Journal Paper | 1 October 1993

Thin silicon nitride films to increase resolution in e-beam lithography

Elizabeth Dobisz, Christie Marrian, R. Salvino, Mario Ancona, Kee Rhee, Martin Peckerar

OE, Vol. 32, Issue 10, (October 1993) https://doi.org/10.1117/12.10.1117/12.145970

KEYWORDS: Silicon, Electrons, Silicon films, Lithography, Electron beam lithography, Tungsten, Resolution enhancement technologies, Monte Carlo methods, Field effect transistors, X-rays

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Proceedings Article | 24 June 1993 Paper

Thin silicon nitride films to increase resolution in e-beam lithography

Elizabeth Dobisz, Christie Marrian, R. Salvino, Mario Ancona, Kee Rhee, Martin Peckerar

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146500

KEYWORDS: Silicon, Electrons, Resolution enhancement technologies, Monte Carlo methods, Silicon films, Tungsten, Lithography, Electron beam lithography, Electron beams, X-rays

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Proceedings Article | 9 July 1992 Paper

Scanning tunneling microscope lithography: a viable lithographic technology?

Christie Marrian, Elizabeth Dobisz, John Dagata

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136012

KEYWORDS: Scanning tunneling microscopy, Lithography, Electron beam lithography, Control systems, Silicon, Servomechanisms, Scanners, Microfabrication, Reactive ion etching, Oxides

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Showing 5 of 12 publications

SPIE Conference Volume | 16 October 2018

Nanoengineering: Fabrication, Properties, Optics, and Devices XV

SPIE Conference Volume | 28 September 2017

Nanoengineering: Fabrication, Properties, Optics, and Devices XIV

SPIE Conference Volume | 5 December 2016

Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

SPIE Conference Volume | 22 September 2015

Nanoengineering: Fabrication, Properties, Optics, and Devices XII

SPIE Conference Volume | 16 September 2014

Nanoengineering: Fabrication, Properties, Optics, and Devices XI

Showing 5 of 18 publications

Conference Committee Involvement (32)

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XXI

20 August 2024 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX

20 August 2023 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XIX

21 August 2022 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVIII

1 August 2021 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII

24 August 2020 | Online Only, California, United States

Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI

11 August 2019 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XV

21 August 2018 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XIV

9 August 2017 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

30 August 2016 | San Diego, California, United States

Alternative Lithographic Technologies VIII

22 February 2016 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XII

11 August 2015 | San Diego, California, United States

Alternative Lithographic Technologies VII

23 February 2015 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices XI

19 August 2014 | San Diego, California, United States

Alternative Lithographic Technologies VI

24 February 2014 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices X

27 August 2013 | San Diego, California, United States

Alternative Lithographic Technologies V

25 February 2013 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices IX

14 August 2012 | San Diego, California, United States

Alternative Lithographic Technologies IV

13 February 2012 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices VIII

23 August 2011 | San Diego, California, United States

Alternative Lithographic Technologies III

1 March 2011 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices VII

3 August 2010 | San Diego, California, United States

Alternative Lithographic Technologies II

23 February 2010 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices VI

4 August 2009 | San Diego, California, United States

Alternative Lithographic Technologies

24 February 2009 | San Jose, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices V

13 August 2008 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices IV

27 August 2007 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices III

15 August 2006 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices II

3 August 2005 | San Diego, California, United States

Nanoengineering: Fabrication, Properties, Optics, and Devices

4 August 2004 | Denver, Colorado, United States

Nanofabrication Technologies

3 August 2003 | San Diego, California, United States

Emerging Lithographic Technologies V

27 February 2001 | Santa Clara, CA, United States

Emerging Lithographic Technologies IV

28 February 2000 | Santa Clara, CA, United States

Showing 5 of 32 Conference Committees

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