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Dr. Gabi Zeltzer
Research Staff Member
SPIE Involvement:
Author
Publications (3)
SPIE Journal Paper | 7 August 2012
Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
JM3, Vol. 11, Issue 3, 031405, (August 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.3.031405
KEYWORDS: Nanoimprint lithography, Chromium, Reactive ion etching, Lithography, Silicon, Double patterning technology, Electron beam lithography, Polymethylmethacrylate, Magnetism, Directed self assembly
Proceedings Article | 21 March 2012 Paper
Fabrication of templates with rectangular bits on circular tracks by combining block copolymer directed self-assembly and nanoimprint lithography
Proceedings Volume 8323, 832319 (2012) https://doi.org/10.1117/12.916592
KEYWORDS: Reactive ion etching, Nanoimprint lithography, Chromium, Lithography, Electron beam lithography, Oxygen, Silicon, Magnetism, Double patterning technology, Directed self assembly
Proceedings Article | 14 October 2011 Paper
Imprint lithography template technology for bit patterned media (BPM)
J. Lille, K. Patel, R. Ruiz, T.-W. Wu, H. Gao, Lei Wan, G. Zeltzer, E. Dobisz, T. Albrecht
Proceedings Volume 8166, 816626 (2011) https://doi.org/10.1117/12.898785
KEYWORDS: Beam propagation method, Etching, Magnetism, Lithography, Silicon, Head, Electron beam lithography, Oxides, Sensors, Scanning electron microscopy
Conference Committee Involvement (2)
Nanoengineering: Fabrication, Properties, Optics, and Devices VII
3 August 2010 | San Diego, California, United States
Nanoengineering: Fabrication, Properties, Optics, and Devices VI
4 August 2009 | San Diego, California, United States
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