Dr. Gioia Della Giustina Profile

Dr. Gioia Della Giustina

at Univ degli Studi di Padova

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Publications (6)

Proceedings Article | 3 January 2019 Paper

The ENEA discharge produced plasma extreme ultraviolet source and its patterning applications

L. Mezi, S. Bollanti, S. Botti, G. Brusatin, L. Businaro, G. Della Giustina, P. Di Lazzaro, M. Fagnoni, F. Flora, A. Gerardino, D. Murra, S. Protti, A. Torre, E. Torti

Proceedings Volume 11042, 110420Z (2019) https://doi.org/10.1117/12.2522469

KEYWORDS: Extreme ultraviolet, Plasma, Graphene, Photomasks, Optical lithography, Extreme ultraviolet lithography, Spatial resolution, Silicon, Photoresist materials, Lithography

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Proceedings Article | 27 March 2017 Paper

Chemical changes in hybrid photoresists before and after exposure by in situ NEXAFS analysis

Roberto Fallica, Benjamin Watts, Gioia Della Giustina, Laura Brigo, Giovanna Brusatin, Yasin Ekinci

Proceedings Volume 10146, 101461F (2017) https://doi.org/10.1117/12.2258215

KEYWORDS: Chemical analysis, Extreme ultraviolet lithography, X-rays, Photoresist materials, Absorption, X-ray lithography, Electron beam lithography, Materials science, Photoresist processing, Photoresist technology, Lithography, Extreme ultraviolet, Silicon, Photons

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Proceedings Article | 10 September 2014 Paper

Hybrid materials: a bottom-up approach for nanotechnology applications

Laura Brigo, Erika Zanchetta, Gioia Della Giustina, Giovanna Brusatin

Proceedings Volume 9161, 91610B (2014) https://doi.org/10.1117/12.2066677

KEYWORDS: Lithography, Sol-gels, Photomasks, Resistance, Silicon, Scanning electron microscopy, Active optics, Nanostructures, Molecules, Optical lithography

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Proceedings Article | 3 May 2013 Paper

Development of active gratings for the spectral selection of ultrafast pulses

Fabio Frassetto, Stefano Bonora, Giovanna Brusatin, Gioia Della Giustina, Salvatore Stagira, Caterina Vozzi, Erika Zanchetta, Luca Poletto

Proceedings Volume 8778, 87780C (2013) https://doi.org/10.1117/12.2019980

KEYWORDS: Diffraction gratings, Monochromators, Ultrafast phenomena, Extreme ultraviolet, Mirrors, Diffraction, Spherical lenses, Optical design, Vignetting, Interferometers

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We present the design, realization and characterization of active deformable gratings for extreme-ultraviolet monochromators for ultrashort pulses. The core device consists of a bimorph deformable mirror on the top of which a diffraction grating with laminar profile is realized by UV lithography. The curvature radius of the grating substrate can be varied changing the voltage applied to an underlying piezo-actuator. The advantage of this technology is to provide gratings with high optical quality, robust, compatible with any coating deposition and realized with only vacuumcompatible materials. We present the characterization of a time-delay compensated monochromator realized with these devices, showing that the active grating can optimize the beam focusing through its rotation and deformation. Two equal active gratings have been mounted in a compensated configuration to realize a grazing-incidence double-grating monochromator for the spectral selection of ultrashort pulses and the simultaneous compensation of the pulse front-tilt given by the diffraction. The wavelength scanning is performed by the first grating through rotation. The radiation is focused on the intermediate plane, where a slit carries out the spectral selection. Finally, the second grating compensates for the pulse front-tilt given by the first one. The spectral focusing of both gratings is maintained at the different wavelengths through the variation of the radii of curvature. The instrument has been tested with a Ti:Sa laser operated at 800 nm. We have been able to demonstrate that the double-grating configuration with active gratings compensates for the pulse front-tilt, that is reduced from 1 ps at the intermediate plane to 100 fs at the output. The final value is limited by the group delay dispersion of the monochromator within the 10-nm bandwidth of the laser. A configuration for the selection on XUV ultrashort pulses has been theoretically studied and the expected performances presented. Active gratings may be considered as a cheaper and more flexible alternative to standard gratings for the realization of extremeultraviolet monochromators for ultrafast pulses, such as free-electron lasers and high-order laser harmonics.

Proceedings Article | 18 February 2010 Paper

One- and two-photon pumped soft lithographed DFB laser systems based on semiconductor core-shell quantum dots

F. Todescato, I. Fortunati, S. Gardin, R. Signorini, R. Bozio, J. Jasieniak, A. Martucci, G. Della Giustina, G. Brusatin, M. Guglielmi

Proceedings Volume 7582, 75821C (2010) https://doi.org/10.1117/12.841943

KEYWORDS: Quantum dots, Sol-gels, Zirconium dioxide, Absorption, Semiconductors, Luminescence, Laser systems engineering, Prototyping, Bioalcohols, Quartz

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Proceedings Article | 20 April 2006 Paper

Synthesis of 3-glycidoxypropyltrimethoxysilane-TiO₂ UV-sensitive waveguides

S. Gardin, R. Bozio, G. Brusatin, G. Della Giustina, E. Giorgetti, M. Guglielmi, R. Signorini

Proceedings Volume 6192, 619232 (2006) https://doi.org/10.1117/12.663269

KEYWORDS: Ultraviolet radiation, Refractive index, Sol-gels, Epoxies, Absorption, Titanium, Waveguides, FT-IR spectroscopy, Quartz, Ellipsometry

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Showing 5 of 6 publications

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