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Gyeongwon Seo
at S&S Tech
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Publications (1)
Proceedings Article | 21 November 2023 Poster + Paper
A study on the imaging characteristics of phase shift mask for EUV technology with novel material
Minkyu P., Mikyung W., Gyeongwon S., Yongdae K., Chulkyu Y., Jonghwa L., Cheol S.
Proceedings Volume 12751, 127511B (2023) https://doi.org/10.1117/12.2687346
KEYWORDS: Extreme ultraviolet, Phase shifts, Resolution enhancement technologies, Optical properties, Optical lithography, Materials properties, Manufacturing, Lithography, Extreme ultraviolet lithography, Etching
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