Mr. Hiroki Futatsuya Profile

Hiroki Futatsuya

manager at Fujitsu Ltd

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Author

Publications (9)

Proceedings Article | 19 May 2011 Paper

Mask data processing technique using GPU for reducing computer cost

Ryo Tsujimura, Kozo Ogino, Hiromi Hoshino, Shigeo Satoh, Kazumasa Morishita, Satoshi Yoshikawa, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Satoshi Yamauchi, Tomoyuki Okada, Naoyuki Ishiwata, Motoshu Miyajima

Proceedings Volume 8081, 80810I (2011) https://doi.org/10.1117/12.899496

KEYWORDS: Optical proximity correction, Data processing, Photomasks, Computing systems, Distributed computing, Manufacturing, Graphics processing units, Fourier transforms, Semiconductors, Digital image processing

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Proceedings Article | 11 May 2009 Paper

Improvement of simulation accuracy using a non Gaussian kernel

Hiroki Futatsuya, Tomohiko Yamamoto, Satoshi Yoshikawa, Tatsuo Chijimatsu, Satoru Asai

Proceedings Volume 7379, 737930 (2009) https://doi.org/10.1117/12.830611

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, Convolution, Optics manufacturing, Bessel functions, Wafer-level optics, Optical simulations

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Proceedings Article | 26 March 2007 Paper

New double exposure technique without alternating phase-shift mask

Tomohiko Yamamoto, Teruyoshi Yao, Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai

Proceedings Volume 6520, 65202P (2007) https://doi.org/10.1117/12.711956

KEYWORDS: Photomasks, Logic devices, Double patterning technology, Binary data, Reticles, Design for manufacturing, Image quality, Resolution enhancement technologies, Phase shifts, Optical simulations

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Proceedings Article | 20 March 2006 Paper

Optimization of contact hole lithography for 65-nm node logic LSI

Yuji Setta, Hiroki Futatsuya, Atsushi Sagisaka, Tatsuo Chijimatsu, Takayoshi Minami, Fumitoshi Sugimoto, Seiichi Ishikawa, Satoru Asai

Proceedings Volume 6154, 61543T (2006) https://doi.org/10.1117/12.656224

KEYWORDS: SRAF, Lithographic illumination, Lithography, Fiber optic illuminators, Logic, Optical lithography, Photomasks, Semiconducting wafers, Industrial chemicals, Resolution enhancement technologies

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Proceedings Article | 13 March 2006 Paper

Design-friendly DFM rule

Morimi Osawa, Takayoshi Minami, Hiroki Futatsuya, Satoru Asai

Proceedings Volume 6156, 61560G (2006) https://doi.org/10.1117/12.656271

KEYWORDS: SRAF, Design for manufacturing, Lithography, Optical proximity correction, Diffusion, Resolution enhancement technologies, Monte Carlo methods, Manufacturing, Data modeling, Bridges

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Proceedings Article | 28 May 2004 Paper

Model-based OPC/DRC considering local flare effects

Hiroki Futatsuya, Teruyoshi Yao, Morimi Osawa, Kozo Ogino, Hiromi Hoshino, Hiroshi Arimoto, Yasuhide Machida, Satoru Asai

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535076

KEYWORDS: Optical proximity correction, Printing, Photomasks, Model-based design, Semiconducting wafers, Light scattering, Diffraction, Acquisition tracking and pointing, Manufacturing, Lithography

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Proceedings Article | 30 July 2002 Paper

Model-based OPC for phase-shifter edge lithography

Hiroki Futatsuya, Tatsuo Chijimatsu, Minami Takayoshi, Ryo Tsujimura, Yoshihisa Komura, Yoshio Ito, Satoru Asai

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474495

KEYWORDS: Optical proximity correction, Model-based design, Photomasks, Lithography, Phase shifts, Optics manufacturing, Etching, Computing systems, Semiconducting wafers, Critical dimension metrology

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Proceedings Article | 26 July 1999 Paper

Development of a lithographic DRC technique for interactive use and batch processing

Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Isamu Hanyu

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354380

KEYWORDS: Lithography, Optical proximity correction, Photomasks, Binary data, Optics manufacturing, Scanning electron microscopy, Geometrical optics, Optical simulations, Optical lithography, Very large scale integration

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Proceedings Article | 7 July 1997 Paper

Practical method of evaluating two-dimensional resist features for lithographic DRC

Hiroki Futatsuya, Tatsuo Chijimatsu, Satoru Asai, Isamu Hanyu

Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.275985

KEYWORDS: Lithography, Optics manufacturing, Optical proximity correction, Optical lithography, Very large scale integration, Design for manufacturability

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Showing 5 of 9 publications

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