Jaemin Cho
at Applied Materials Korea Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295517 (2024) https://doi.org/10.1117/12.3012913
KEYWORDS: Shrinkage, Etching, Extreme ultraviolet, Photoresist materials, Metrology, Semiconducting wafers, Extreme ultraviolet lithography, Photoacid generators, Stochastic processes, Critical dimension metrology

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