Mr. Michael D. Hyatt Profile

Michael D. Hyatt

Senior Engineer at Micron Technology Inc

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Author

Publications (7)

Proceedings Article | 11 October 2023 Paper

A tutorial: materials qualification and process optimization using statistically designed experiments

Matthew Huck, Michael Hyatt

Proceedings Volume 12808, 1280808 (2023) https://doi.org/10.1117/12.3011875

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Proceedings Article | 27 March 2014 Paper

Anti-spacer double patterning

Michael Hyatt, Karen Huang, Anton DeVilliers, Mark Slezak, Zhi Liu

Proceedings Volume 9051, 905118 (2014) https://doi.org/10.1117/12.2045617

KEYWORDS: Double patterning technology, Line width roughness, Optical lithography, Photoresist processing, Coating, Semiconducting wafers, Etching, Lithography, Photoresist materials, Plasma

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Proceedings Article | 16 April 2011 Paper

Predicting resist sensitivity to chemical flare effects though use of exposure density gradient method

Michael Hyatt, Anton DeVilliers, Kaveri Jain

Proceedings Volume 7972, 79721M (2011) https://doi.org/10.1117/12.881597

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Cadmium, Photoresist processing, Chemically amplified resists, Testing and analysis, Imaging devices, Reticles, Manufacturing, Contamination

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Proceedings Article | 4 March 2010 Paper

Simulation-based pattern matching using scanner metrology and design data to reduce reliance on CD metrology

Yuan He, Erik Byers, Scott Light, Danielle Hines, Anton Devilliers, Mike Hyatt, Jianming Zhou, Vinay Nair, Zongchang Yu, Yu Cao, Xu Xie, Wenjin Shao, Rafael Aldana, Ronald Goossens, Chang-Qun Ma, Junwei Lu, Hua-yu Liu, Chris Aquino, Peter Engblom, Tjitte Nooitgedagt, Eric Janda

Proceedings Volume 7640, 764014 (2010) https://doi.org/10.1117/12.848255

KEYWORDS: Scanners, Wafer-level optics, Semiconducting wafers, Metrology, Data modeling, Calibration, Critical dimension metrology, Optics manufacturing, Performance modeling, Optical simulations

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Proceedings Article | 4 March 2010 Paper

Improving aberration control with application specific optimization using computational lithography

Jianming Zhou, Youping Zhang, Peter Engblom, Mike Hyatt, Eric Wu, Martin Snajdr, Anton deVilliers, Yuan He, Craig Hickman, Peng Liu, Dennis de Lang, Bernd Geh, Erik Byers, Scott Light

Proceedings Volume 7640, 76400K (2010) https://doi.org/10.1117/12.846697

KEYWORDS: Semiconducting wafers, Scanners, Computational lithography, Optimization (mathematics), Calibration, Finite element methods, Thermal modeling, Computer simulations, Data modeling, Critical dimension metrology

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Proceedings Article | 23 March 2007 Paper

Thin bilayer resists for 193-nm and future photolithography II

Yoshi Hishiro, Michael Hyatt

Proceedings Volume 6519, 651935 (2007) https://doi.org/10.1117/12.712737

KEYWORDS: Scanning electron microscopy, Interferometers, Silicon, Scanners, Etching, Thin films, Lithographic illumination, Immersion lithography, Line edge roughness, Lithography

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Proceedings Article | 29 March 2006 Paper

Thin bilayer resists approach for 193nm and future photolithography

Yoshi Hishiro, Michael Hyatt

Proceedings Volume 6153, 61532W (2006) https://doi.org/10.1117/12.659630

KEYWORDS: Silicon, Etching, Lithography, Thin films, Photoresist processing, Plasma, Carbon, FT-IR spectroscopy, Scanning electron microscopy, Oxidation

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Showing 5 of 7 publications

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