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Ralf Schoenberger
at Carl Zeiss SMT GmbH
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Publications (1)
Proceedings Article | 6 October 2020 Presentation + Paper
High-end EUV photomask repairs for 5nm technology and beyond
Horst Schneider, Fan Tu, Laura Ahmels, Bartholomaeus Szafranek, Katharina Gries, Daniel Rhinow, Sebastian Vollmar, Andreas Krugmann, Ralf Schoenberger, Walter Pauls, Andreas Verch, Renzo Capelli, Alice Vincenzo, Grizelda Kersteen, Hubertus Marbach, Michael Waldow
Proceedings Volume 11518, 1151808 (2020) https://doi.org/10.1117/12.2572879
KEYWORDS: Extreme ultraviolet, Photomasks, Electron beams, Scanning electron microscopy, Semiconductors, Manufacturing, Extreme ultraviolet lithography, Lithography, Double patterning technology, Deep ultraviolet
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