Mr. Ren-Jyh Leu Profile

Ren-Jyh Leu

at Taiwan Semiconductor Mfg Co

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Proceedings Article | 16 October 2001 Paper

Parameter evaluation of photoresist coating model by using orthogonal experiment and regression analysis

Ren-Jyh Leu, Yu-Pen Fun, Hung-Chih Chen, Kun-I Lee, Hsiang-Chung Liu

Proceedings Volume 4602, (2001) https://doi.org/10.1117/12.445735

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In this paper, we want to optimize photo-resist coating recipe by using orthogonal experiment and statistical regression analysis. We combined two major factors influenced coating performance -- 'wafer coating time' & 'wafer spinning speed' in TRACK unit with IDI^TM pump dispense recipe. Eventually, IDI^TM pump dispense recipe contained of four steps dispense time and dispense pressure. By using orthogonal experiment and statistical regression method we obtained set of process parameters which have good predicted performance values. Based on those data, we could apply it on different viscosity type resist to get good coating performance as decreasing resist dispense volume from 3 cc/pcs to 1.6 cc/pcs. Results showed the performance of CD (Critical Dimension) and CP (Chip Probe) yield was comparable to original 3 cc/pcs coating recipe condition. Actually, we could optimize coating recipe to reach resist usage decreasing purpose.

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