Dr. Rui Chen Profile

Dr. Rui Chen

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Publications (1)

Proceedings Article | 27 March 2017 Presentation + Paper

Line end shortening and iso-dense etch bias improvement by ALD spacer shrink process

Rui Chen, Granger Lobb, Aleksandra Clancy, Bradley Morgenfeld, Shyam Pal

Proceedings Volume 10146, 101461D (2017) https://doi.org/10.1117/12.2260450

KEYWORDS: Atomic layer deposition, Etching, Optical lithography, Reactive ion etching, Semiconducting wafers, Semiconductors, Back end of line, Critical dimension metrology, Metals, Photomasks, Scanning electron microscopy

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