Dr. Shih-Ying Chen Profile

Dr. Shih-Ying Chen

Consultant at Mentor Graphics Taiwan Ltd

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Publications (7)

Proceedings Article | 28 August 2003 Paper

Effective placement of chips on a shuttle mask

Shih-Ying Chen, Eric Lynn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504220

KEYWORDS: Photomasks, Databases, Computer aided design, Algorithm development, Data processing, Visualization, Semiconductors, Manufacturing, Binary data, Integrated circuits

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Proceedings Article | 1 August 2002 Paper

Pattern recognition in the database of a mask layout

Shih-Ying Chen, Eric Lynn, Jaw-Jung Shin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476935

KEYWORDS: Pattern recognition, Genetic algorithms, Fuzzy logic, Detection and tracking algorithms, Optical proximity correction, Databases, Photomasks, Semiconducting wafers, Algorithm development, Visualization

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Proceedings Article | 1 August 2002 Paper

Template of specifications for assist feature script implementation

Shih-Ying Chen, Eric Lynn

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476942

KEYWORDS: SRAF, Lithography, Communication engineering, Computer aided design, Photomasks, Feature extraction, Collimation, Visualization, Optical lithography, Semiconducting wafers

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The benefit of assist feature has been greatly appreciated in the aspect of bringing the process windows of isolated and semi-isolated patterns into together with that of dense patterns; hence a common process window is attainable. The width of assist feature and the distance between assist feature and main pattern are two basic, fundamental specifications from the viewpoint of lithographer. In fact, there exist other specifications that are essential to success of assist feature implementation. For instance, the distance of two adjacent assist features and the gap between ends of assist feature to main patterns are all of necessity in terms of lithographic performance. From the perspective of feasibility and ease of photomask fabrication there are some specifications and/or constraints that should be implemented and enforced. One illustrative example is the extent of assist feature end pullback as two slightly off- axis assist features either joint or separate with a distance smaller than a given minimum space. Recently, the request of multiple assist features has enormously increased. The task of implementing multiple assist features is not trivial at all; the fact is that it introduces many more specifications to be contended. Under most circumstances, the implementation of assist feature involves lithographic engineers, mask-making engineers, and CAD engineers or script implementation engineers; this brings out the importance of communication mechanism that can describe the true intention of each specification. The question is that whether the mechanism is sufficient or not. The goal of the present work is to develop templates of specifications for assist feature implementation. Currently, many conditions and constraints have been identified and collected. One example is the central-edge template, which is allowed to prioritize the 'central assist feature' vs. 'edge assist feature.' It is believed that with the presence of specification templates both CAD and script implementation engineer will have a clear and consistent guideline to achieve the true intention of each specification.

Proceedings Article | 1 August 2002 Paper

Progressive self-learning photomask defect classification

Eric Lynn, Shih-Ying Chen, Tyng-Hao Hsu, Chang-Cheng Hung, Chin-Hsiang Lin

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.477012

KEYWORDS: Photomasks, Image processing, Library classification systems, Inspection, Detection and tracking algorithms, Image segmentation, Solids, Feature extraction, Optical proximity correction, Manufacturing

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Proceedings Article | 1 August 2002 Paper

Life is better without nonorthogonal or non-45-deg. edges: a practical solution to alleviate the pain on OPC and mask writing

Eric Lynn, Shih-Ying Chen

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476934

KEYWORDS: Optical proximity correction, Algorithm development, Photomasks, Computer programming, Semiconductors, Integrated circuits, Data processing, Detection and tracking algorithms, Visualization

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Proceedings Article | 30 July 2002 Paper

Flexible fragmentation rules for next-generation OPC: tag prior to fragmentation

Shih-Ying Chen, Eric Lynn

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474503

KEYWORDS: Optical proximity correction, Model-based design, Solids, Data modeling, Visualization, Databases, Semiconducting wafers, Roads, Optical lithography, Detection and tracking algorithms

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Proceedings Article | 11 March 2002 Paper

Prevention instead of cure: pre-OPC treatment of photomask layouts

Jerry Huang, Karl Chiu, Snow Lee, Shih-Ying Chen, Eric Lynn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458357

KEYWORDS: Optical proximity correction, Photomasks, Algorithm development, Databases, Detection and tracking algorithms, Data modeling, Computing systems, Lithography, Optical lithography, Solids

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Showing 5 of 7 publications

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