Mr. Chih Chiang Huang Profile

Chih Chiang Huang

at ProMOS Technologies Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 20 March 2006 Paper

Enhancing DRAM printing process window by using inverse lithography technology (ILT)

Chih-Wei Chu, Becky Tsao, Karl Chiou, Snow Lee, Jerry Huang, Yong Liu, Timothy Lin, Andrew Moore, Linyong Pang

Proceedings Volume 6154, 61543O (2006) https://doi.org/10.1117/12.657015

KEYWORDS: Photomasks, Lithography, Image quality, Semiconductors, Semiconducting wafers, Printing, Scanning electron microscopy, Light sources, Quality measurement, Manufacturing

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Proceedings Article | 4 November 2005 Paper

Process window impact of progressive mask defects: its inspection and disposition techniques (go/no-go criteria) via a lithographic detector

Jerry Huang, Lan-Hsin Peng, Chih-Wei Chu, Kaustuve Bhattacharyya, Ben Eynon, Farzin Mirzaagha, Tony Dibiase, Kong Son, Jackie Cheng, Ellison Chen, Den Wang

Proceedings Volume 5992, 599206 (2005) https://doi.org/10.1117/12.632039

KEYWORDS: Photomasks, Sensors, Inspection, Lithography, Semiconducting wafers, Defect inspection, Defect detection, Crystals, Detector development, Deep ultraviolet

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Proceedings Article | 1 August 2002 Paper

Pattern fidelity improvement by considering the underlying patterns at defocus

Karl Chiou, Jerry Huang, S. Lee, Chih Yu Lee, Nail Tang, Janet Peng

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476987

KEYWORDS: Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Metals, Model-based design, Data modeling, Distortion, Visualization, Silicon, Pattern recognition

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Proceedings Article | 11 March 2002 Paper

Prevention instead of cure: pre-OPC treatment of photomask layouts

Jerry Huang, Karl Chiu, Snow Lee, Shih-Ying Chen, Eric Lynn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458357

KEYWORDS: Optical proximity correction, Photomasks, Algorithm development, Databases, Detection and tracking algorithms, Data modeling, Computing systems, Lithography, Optical lithography, Solids

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