Dr. Steven E. Grantham Profile

Dr. Steven E. Grantham

Physicist at National Institute of Standards and Technology

SPIE Involvement:

Conference Program Committee | Author

Publications (35)

Proceedings Article | 21 November 2023 Presentation + Paper

NIST efforts in extreme-ultraviolet metrology

C. Tarrio, S. Grantham, R. Vest, T. Germer, B. Barnes, S. Moffitt, B. Simonds, M. Spidell

Proceedings Volume 12750, 127500F (2023) https://doi.org/10.1117/12.2686832

KEYWORDS: Extreme ultraviolet, Tunable filters, Metrology, Extreme ultraviolet lithography, Radiometry, Scatterometry, Vacuum chambers, Reflectivity, Polarization, Equipment

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Proceedings Article | 14 June 2023 Presentation

Characterization of hyperspectral imagers utilizing color tile standards traceable to NIST

David Allen, Clarence Zarobila, Steven Grantham

Proceedings Volume PC12519, PC1251903 (2023) https://doi.org/10.1117/12.2664008

KEYWORDS: Imaging systems, Hyperspectral imaging, Spectrometers, Reflectivity, Colorimetry

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Proceedings Article | 13 December 2020 Poster

A new approach to the absolute spectrophotometric calibration of standard stars: Vega and Sirius

Susana Deustua, John Woodward, Joseph Rice, Steven Brown, Stephen Maxwell, Florian Kerber, Alain Smette, Ralph Bohlin, Clarence Zarobila, Thinh Bui, Steven Grantham

Proceedings Volume 11445, 114453A (2020) https://doi.org/10.1117/12.2562046

KEYWORDS: Stars, Calibration, Spectral calibration, Astrophysics, Galactic astronomy, Astronomy, Large telescopes, Visible radiation, Near infrared, Environmental monitoring

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Proceedings Article | 14 May 2018 Presentation

Establishing traceable radiation thermometry with in-line imaging system at the NIST AMMT facility (Conference Presentation)

Ivan Zhirnov, Vladimir Khromchenko, Brandon Lane, Steven Grantham, Sergey Mekhontsev

Proceedings Volume 10661, 106610C (2018) https://doi.org/10.1117/12.2305002

KEYWORDS: Imaging systems, Radiation thermometry, Temperature metrology, Calibration, Additive manufacturing, Metrology, Stray light, System integration, Pyrometry, Black bodies

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Proceedings Article | 9 May 2016 Paper

Optical design and initial results from NIST's AMMT/TEMPS facility

Steven Grantham, Brandon Lane, Jorge Neira, Sergey Mekhontsev, Mihaela Vlasea, Leonard Hanssen

Proceedings Volume 9738, 97380S (2016) https://doi.org/10.1117/12.2214246

KEYWORDS: Additive manufacturing, Laser processing, Process control, Optical design, Radiometry, Temperature metrology, Feedback control, Mirrors, Beam splitters, Fiber lasers, Imaging systems, Reflectivity, Sensors, Image processing, Optical scanning

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Proceedings Article | 16 March 2015 Paper

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

Michael Kriese, Yuriy Platonov, Jim Rodriguez, Gary Fournier, Steven Grantham, Charles Tarrio, John Curry, Shannon Hill, Thomas Lucatorto

Proceedings Volume 9422, 94220K (2015) https://doi.org/10.1117/12.2085934

KEYWORDS: Multilayers, Reflectivity, Extreme ultraviolet lithography, Extreme ultraviolet, Annealing, Resistance, Oxides, Reflectometry, Silicon, Oxidation

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Proceedings Article | 17 April 2014 Paper

Improved measurement capabilities at the NIST EUV reflectometry facility

C. Tarrio, S. Grantham, T. Germer, J. Rife, T. Lucatorto, M. Kriese, Y. Platonov, L. Jiang, J. Rodriguez

Proceedings Volume 9048, 90481I (2014) https://doi.org/10.1117/12.2046290

KEYWORDS: Sensors, Extreme ultraviolet, Reflectometry, Polarization, Radiation effects, Reflectivity, Motion models, EUV optics, 3D modeling, Data modeling

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Proceedings Article | 18 March 2014 Paper

Development of an EUVL collector with infrared radiation suppression

Michael Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Ulrich Mueller, Jay Daniel, Shayna Khatri, Adam Magruder, Steven Grantham, Charles Tarrio, Thomas Lucatorto

Proceedings Volume 9048, 90483C (2014) https://doi.org/10.1117/12.2049279

KEYWORDS: Extreme ultraviolet, Reflectivity, Infrared radiation, Extreme ultraviolet lithography, Plasma, Infrared technology, Neodymium, Nickel, Surface finishing, Diffraction gratings

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Proceedings Article | 1 April 2013 Paper

Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

C. Tarrio, R. Berg, S. Hill, S. Grantham, N. Faradzhev, T. Lucatorto

Proceedings Volume 8679, 867920 (2013) https://doi.org/10.1117/12.2011663

KEYWORDS: Semiconducting wafers, Carbon, Extreme ultraviolet, Contamination, Photoresist materials, Extreme ultraviolet lithography, Mirrors, Molecules, Manufacturing, Scanners

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Proceedings Article | 26 March 2011 Paper

Optics contamination studies in support of high-throughput EUV lithography tools

S. Hill, N. Faradzhev, L. Richter, S. Grantham, C. Tarrio, T. Lucatorto, S. Yulin, M. Schürmann, V. Nesterenko, T. Feigl

Proceedings Volume 7969, 79690M (2011) https://doi.org/10.1117/12.879852

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, EUV optics, Carbon, Molecules, Synchrotrons, Mirrors, Ruthenium, Spectroscopic ellipsometry

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Proceedings Article | 26 March 2011 Paper

The NIST EUV facility for advanced photoresist qualification using the witness-sample test

S. Grantham, C. Tarrio, S. Hill, L. Richter, T. Lucatorto, J. van Dijk, C. Kaya, N. Harned, R. Hoefnagels, M. Silova, J. Steinhoff

Proceedings Volume 7969, 79690K (2011) https://doi.org/10.1117/12.879519

KEYWORDS: Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Extreme ultraviolet, Contamination, Scanners, Electrons, Mirrors, Carbon, Synchrotrons

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SPIE Journal Paper | 1 April 2009

Design considerations for a cascaded grating interferometer suitable for extreme ultraviolet interference lithography

Zachary Levine, Steven Grantham, Thomas Lucatorto

JM3, Vol. 8, Issue 02, 021202, (April 2009) https://doi.org/10.1117/12.10.1117/1.3112008

KEYWORDS: Interferometers, Extreme ultraviolet, Wavefronts, Spherical lenses, Optical design, Visibility, Lithography, Extreme ultraviolet lithography, Synchrotrons, Diffraction gratings

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Proceedings Article | 18 March 2009 Paper

EUVL dosimetry at NIST

C. Tarrio, S. Grantham, M. Cangemi, R. Vest, T. Lucatorto, Noreen Harned

Proceedings Volume 7271, 72713X (2009) https://doi.org/10.1117/12.813690

KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Calibration, Photoresist materials, Extreme ultraviolet lithography, Polymers, Photodiodes, Standards development, Coating, Transmittance

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Proceedings Article | 28 March 2008 Paper

Extreme ultraviolet resist outgassing and its effect on nearby optics

Gregory Denbeaux, Rashi Garg, Chimaobi Mbanaso, Justin Waterman, Leonid Yankulin, Alin Antohe, Yu-Jen Fan, Warren Montgomery, Kim Dean, Kevin Orvek, Andrea Wüest, Yayi Wei, Frank Goodwin, Obert Wood, Chiew-Seng Koay, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham, Saša Bajt

Proceedings Volume 6921, 69211G (2008) https://doi.org/10.1117/12.772670

KEYWORDS: Mirrors, Reflectivity, EUV optics, Molecules, Extreme ultraviolet lithography, Contamination, Spectroscopy, Extreme ultraviolet, Photoresist materials, Calibration

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Proceedings Article | 20 March 2008 Paper

Quantitative measurement of outgas products from EUV photoresists

C. Tarrio, B. Benner, R. Vest, S. Grantham, S. Hill, T. Lucatorto, J. Hendricks, P. Abbott, G. Denbeaux, C. Mbanaso, A. Antohe, K. Orvek, K.-W. Choi

Proceedings Volume 6921, 69211H (2008) https://doi.org/10.1117/12.772686

KEYWORDS: Semiconducting wafers, Molecules, Extreme ultraviolet lithography, Photoresist materials, Statistical analysis, Extreme ultraviolet, Capacitance, EUV optics, Mass spectrometry, Chemical analysis

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Proceedings Article | 18 May 2007 Paper

Multilayers for next-generation x-ray sources

S. Bajt, H. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. Nelson, C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Proceedings Volume 6586, 65860J (2007) https://doi.org/10.1117/12.724786

KEYWORDS: Reflectivity, Mirrors, Multilayers, Free electron lasers, Silicon, X-ray optics, X-rays, X-ray sources, Coating, Optical components

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Proceedings Article | 15 March 2007 Paper

Energetic and thermal Sn interactions and their effect on EUVL source collector mirror lifetime at high temperatures

J. Allain, M. Nieto, M. Hendricks, A. Hassanein, C. Tarrio, S. Grantham, V. Bakshi

Proceedings Volume 6517, 65171V (2007) https://doi.org/10.1117/12.711270

KEYWORDS: Tin, Mirrors, Extreme ultraviolet, Reflectivity, Palladium, Extreme ultraviolet lithography, Ions, Ruthenium, Particles, Chemical species

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Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance under Sn exposure and developing methods to mitigate them. Both Sn ion irradiation and thermal evaporation exposes candidate mirrors tested (i.e., Ru, Rh and Pd) in the experimental facility known as IMPACT (Interaction of Materials with charged Particles and Components Testing). Studies have led to an understanding of how Sn energetic ions compared to Sn thermal atoms affect three main surface properties of the collector mirror: 1) surface chemical state, 2) surface structure and 3) surface morphology. All these properties are crucial in understanding how collector mirrors will respond to Sn-based EUV source operation. This is primarily due to the correlation of how variation in these properties affects the reflectivity of photons in the EUV spectral range of interest (in-band 13.5-nm). This paper discusses the first property and its impact on 13.5-nm reflectivity. Investigation in the IMPACT experiment has focused on Sn thermal and energetic particle exposure on collector mirrors (Ru, Pd and Rh) and its effect on mirror performance as a function of incident thermal flux, incident ion flux, incident angle and temperature. This is possible by a new state-of-the-art in-situ EUV reflectometry system that measures real time relative EUV reflectivity at 15-degree incidence and 13.5-nm during Sn exposure. These results are then compared to at-wavelength EUV reflectivity measurements using the newly upgraded NIST-SURF facility. Sn energetic ions at 1- keV and fluxes of about 10¹³ cm^-2s^-1 are used in conjunction with a moderate flux Sn evaporative source delivering Sn fluences ranging from 10¹⁵-10¹⁷ cm^-2. The temperature of the mirror sample is locally varied between 25 and 200 C with the chemical state of the surface simultaneously monitored using X-ray photoelectron spectroscopy, and lowenergy ion scattering spectroscopy. Results demonstrate the balance between energetic and thermal Sn has on the total Sn surface fraction during exposure and its effect on the structural and reflective properties of the mirror surface.

Proceedings Article | 23 March 2006 Paper

EUV testing of multilayer mirrors: critical issues

S. Hill, I. Ermanoski, S. Grantham, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Chandhok, P. Yan, O. Wood, S. Wurm, N. Edwards

Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502

KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

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Proceedings Article | 8 September 2005 Paper

Narrow-band EUV multilayer coating for the MOSES sounding rocket

Scott Owens, Jeffery Gum, Charles Tarrio, Steven Grantham, Joseph Dvorak, Benjawan Kjornrattanawanich, Ritva Keski-Kuha, Roger Thomas, Charles Kankelborg

Proceedings Volume 5900, 590003 (2005) https://doi.org/10.1117/12.617520

KEYWORDS: Coating, Reflectivity, Extreme ultraviolet, Multilayers, Silicon, Reflection, Iron, Spectrographs, Rockets, Optical design

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Proceedings Article | 6 May 2005 Paper

EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography

S. Grantham, S. Hill, C. Tarrio, R. Vest, T. Lucatorto

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599528

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Sensors, Calibration, Metrology, Silicon, Radiometry, Lithography, Photodiodes, Multilayers

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Proceedings Article | 20 May 2004 Paper

Scaling studies of capping layer oxidation by water exposure with EUV radiation and electrons

W. Clift, Leonard Klebanoff, Charles Tarrio, Steven Grantham, Obert Wood, Stefan Wurm, Nora Edwards

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537403

KEYWORDS: Electrons, Extreme ultraviolet lithography, Silicon, Oxides, Extreme ultraviolet, Oxygen, EUV optics, Mirrors, Reflectivity, Oxidation

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Proceedings Article | 16 June 2003 Paper

Design and performance of capping layers for EUV multilayer mirrors

Sasa Bajt, Henry Chapman, Nhan Nguyen, Jennifer Alameda, Jeffrey Robinson, Michael Malinowski, Eric Gullikson, Andy Aquila, Charles Tarrio, Steven Grantham

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484966

KEYWORDS: Reflectivity, Multilayers, Electron beams, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Ruthenium, Silicon, Molybdenum, Oxidation

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Proceedings Article | 1 July 2002 Paper

First results from the updated NIST/DARPA EUV reflectometry facility

Steven Grantham, Charles Tarrio, Matthew Squires, Thomas Lucatorto

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472309

KEYWORDS: Reflectivity, Sensors, Monochromators, Reflectometry, Extreme ultraviolet, Mirrors, Signal detection, Extreme ultraviolet lithography, Optical filters, Cameras

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Proceedings Article | 20 December 2001 Paper

Upgrades to the NIST/DARPA EUV reflectometry facility

Charles Tarrio, Thomas Lucatorto, Steven Grantham, Matthew Squires, Uwe Arp, Lu Deng

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450961

KEYWORDS: Extreme ultraviolet, Sensors, Reflectometry, Mirrors, Reflectivity, EUV optics, Extreme ultraviolet lithography, Monochromators, Optical filters, Beryllium

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Proceedings Article | 18 June 2001 Paper

Absolute extreme-ultraviolet metrology

Charles Tarrio, Robert Vest, Steven Grantham

Proceedings Volume 4450, (2001) https://doi.org/10.1117/12.431244

KEYWORDS: Extreme ultraviolet, Sensors, Photodiodes, Calibration, Reflectivity, Silicon, Mirrors, Multilayers, Metrology, Extreme ultraviolet lithography

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Proceedings Article | 20 April 1998 Paper

Photo-ionization of glasses by IR femtosecond laser pulses

Oleg Efimov, Leonid Glebov, Steve Grantham, Martin Richardson

Proceedings Volume 3244, (1998) https://doi.org/10.1117/12.306981

KEYWORDS: Glasses, Femtosecond phenomena, Infrared lasers, Color centers, Laser damage threshold, Visible radiation, Absorption, Silicate glass, High power lasers, Luminescence

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Proceedings Article | 13 May 1997 Paper

Photoinduced processes in silicate glasses exposed to IR femtosecond pulses

Oleg Efimov, Kai Gabel, Serge Garnov, Leonid Glebov, Steve Grantham, Martin Richardson, M. Soileau

Proceedings Volume 2966, (1997) https://doi.org/10.1117/12.274231

KEYWORDS: Glasses, Absorption, Femtosecond phenomena, Color centers, Silica, Luminescence, Silicate glass, Ionization, Ultraviolet radiation, Laser damage threshold

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Proceedings Article | 8 May 1996 Paper

Ultrafast semiconductor laser diode seeded Cr:LiSAF regenerative amplifier system

Peter Delfyett, A. Yusim, Steve Grantham, Kai Gaebel, Sangyoun Gee, Martin Richardson, Gerard Alphonse, John Connolly

Proceedings Volume 2701, (1996) https://doi.org/10.1117/12.239727

KEYWORDS: Semiconductor lasers, Optical amplifiers, Laser systems engineering, Ultrafast phenomena, Semiconductors, Diodes, Systems modeling, Laser optics, High power lasers, Oscillators

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Proceedings Article | 8 May 1996 Paper

Extension of femtosecond Cr:LiSAF systems to the 100-TW level

Martin Richardson, Steve Grantham, Jason Eichenholz, Kai Gaebel

Proceedings Volume 2701, (1996) https://doi.org/10.1117/12.239698

KEYWORDS: Optical amplifiers, Pulsed laser operation, Laser systems engineering, Laser development, Crystals, Fusion energy, Femtosecond phenomena, Laser applications, Amplifiers, Laser crystals

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Proceedings Article | 6 May 1996 Paper

Nonlinear coloration and damage of wide-gap glasses by femtosecond laser at 0.85 um

Oleg Efimov, Leonid Glebov, Serge Garnov, M. Soileau, Martin Richardson, Kai Gaebel, Steve Grantham

Proceedings Volume 2796, (1996) https://doi.org/10.1117/12.239751

KEYWORDS: Glasses, Absorption, Femtosecond phenomena, Ionization, Color centers, Luminescence, Borosilicate glass, Silica, Solids, Dielectrics

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Proceedings Article | 8 December 1995 Paper

10-TW femtosecond laser plasma facility

Martin Richardson, Steve Grantham, Kai Gaebel, Gregory Shimkaveg, P. Beaud

Proceedings Volume 2633, (1995) https://doi.org/10.1117/12.228303

KEYWORDS: Optical amplifiers, Crystals, Laser systems engineering, Pulsed laser operation, Femtosecond phenomena, Laser crystals, Plasma, Amplifiers, Laser development, Sapphire lasers

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The availability of ultrashort (100 fs) high intensity lasers capable of producing focused intensities in excess of 10¹⁸ W/cm² provides many new opportunities in studying the interaction of radiation with matter. We describe a new laser plasma facility constructed around a Cr:LiSAF laser system currently capable of output energies of approximately 1 J in times of approximately 100 fs. This facility will be directed initially towards basic studies of the interaction of intense ultrashort laser pulses with dense plasmas, and the generation and application of intense hard x-ray point sources. The laser system we have developed for this facility, uses the new solid- state laser material, Cr:LiSAF. This material has many advantages for the generation of intense ultrashort laser pulses. The spectral gain bandwidth is sufficiently broad for the amplification of pulses shorter than 100 fs in duration. Its florescence lifetime is long enough to permit the use of conventional flashlamp pumping, and its emission cross- section is such that it provides small signal gains high enough to allow its use in high powered chirped pulsed amplification laser architectures. The material can now be fabricated into laser rods up to 25 mm in diameter with low scattering losses and its Cr concentrations can be varied to optimize the small signal gain for specific pump cavities. These factors taken together allow the design of a 100 fs high intensity oscillator-laser system that is simpler in architecture than those based on Ti:sapphire or KrF. Moreover the use of Cr:LiSAF laser crystal elements should enable the generation of much higher powers. In principle as high as 1 PW should be achievable with a laboratory with this approach. Modifications currently being implemented onto our Cr:LiSAF laser system include improvements to pulse contrast, energy extraction, beam uniformity and focusability. The system will soon be incorporated with a 52- port precision target chamber that will be equipped with a broad array of x ray and plasma diagnostics. Several research programs are being designed around this facility. Two of these programs, those relating to the use of hard x rays for the analysis of shock phenomena in solids and the general physics of extremely high magnetic fields are presented.

Proceedings Article | 18 September 1995 Paper

X-ray flash microprobing of structural dynamics in exploding crystals

Gregory Shimkaveg, Kai Gaebel, Steve Grantham, Robert Hannon, Martin Richardson

Proceedings Volume 2523, (1995) https://doi.org/10.1117/12.220991

KEYWORDS: X-rays, Crystals, Plasmas, Explosives, Solids, X-ray imaging, Sensors, Hard x-rays, X-ray diffraction, Crystallography

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Proceedings Article | 18 September 1995 Paper

KeV x-ray imaging of a fs laser plasma with a spherically curved crystal

Kai Gaebel, Robert Hannon, Steve Grantham, Martin Richardson, Masataka Kado, Gregory Shimkaveg

Proceedings Volume 2523, (1995) https://doi.org/10.1117/12.220975

KEYWORDS: Crystals, Plasma, Laser crystals, Mica, X-rays, X-ray imaging, Crystal optics, Femtosecond phenomena, Diffraction, Sensors

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Proceedings Article | 14 October 1994 Paper

Optimum microchannel plate (MCP) configuration for use in high-speed, high-resolution x-ray imaging

Steve Grantham, Edward Miesak, Paul Reese, Martin Richardson

Proceedings Volume 2273, (1994) https://doi.org/10.1117/12.189019

KEYWORDS: Microchannel plates, Cameras, X-ray imaging, Capillaries, Spatial resolution, Coating, X-rays, Capacitors, Imaging devices, Fiber optics

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Proceedings Article | 1 February 1994 Paper

Development of x ray microscopy systems based on laser plasma sources

Martin Richardson, Andrew Vasil'ev, Steve Grantham, Kai Gabel, Masataka Kado

Proceedings Volume 2015, (1994) https://doi.org/10.1117/12.167985

KEYWORDS: X-rays, X-ray microscopy, Plasma, X-ray imaging, Imaging systems, X-ray sources, Microscopes, Microscopy, Laser applications, Image resolution

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