Dr. Chiew-Seng Koay
at IBM
SPIE Involvement:
Author
Publications (43)

Proceedings Article | 28 March 2017 Presentation + Paper
Chiew-seng Koay, Bassem Hamieh, Nelson Felix, John Gaudiello
Proceedings Volume 10145, 101450B (2017) https://doi.org/10.1117/12.2260007
KEYWORDS: Overlay metrology, Semiconducting wafers, Lithography, Metrology, Scanners, Calibration, Optical filters, Near infrared

Proceedings Article | 8 March 2016 Paper
Chiew-seng Koay, Nelson Felix, Bassem Hamieh, Scott Halle, Chumeng Zheng, Stuart Sieg
Proceedings Volume 9778, 97781K (2016) https://doi.org/10.1117/12.2220382
KEYWORDS: Overlay metrology, Image segmentation, Scatterometry, Metrology, Semiconducting wafers, Front end of line, Back end of line, Optical lithography, Inspection, Optical filters, Sensors, Reflectivity, Solids

Proceedings Article | 13 March 2015 Paper
Proceedings Volume 9422, 94220R (2015) https://doi.org/10.1117/12.2085894
KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Inspection, Critical dimension metrology, Lithography, Wafer inspection, Semiconducting wafers, Carbon, Signal processing

Proceedings Article | 29 March 2013 Paper
Proceedings Volume 8682, 86820E (2013) https://doi.org/10.1117/12.2011506
KEYWORDS: Etching, Lithography, Photoresist processing, Critical dimension metrology, Semiconducting wafers, Line width roughness, Line edge roughness, Scanning electron microscopy, Double patterning technology, Chemical reactions

Proceedings Article | 20 March 2012 Paper
Sohan Mehta, Yongan Xu, Guillaume Landie, Vikrant Chauhan, Sean Burns, Peggy Lawson, Bassem Hamieh, Jerome Wandell, Martin Glodde, Yu Yang Sun, Mark Kelling, Alan Thomas, Jeong Soo Kim, James Chen, Hirokazu Kato, Chiahsun Tseng, Chiew-Seng Koay, Yoshinori Matsui, Martin Burkhardt, Yunpeng Yin, David Horak, Shyng-Tsong Chen, Yann Mignot, Yannick Loquet, Matthew Colburn, John Arnold, Terry Spooner, Lior Huli, Dave Hetzer, Jason Cantone, Shinichiro Kawakami, Shannon Dunn
Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560
KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

Showing 5 of 43 publications
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