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Terry Manchester
at Advanced Micro Devices
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Publications (1)
Proceedings Article | 17 May 1994 Paper
Minimization of total overlay errors when matching nonconcentric exposure fields
Moshe Preil, Terry Manchester, Anna Maria Minvielle, Robert Chung
Proceedings Volume 2197, (1994) https://doi.org/10.1117/12.175466
KEYWORDS: Distortion, Overlay metrology, Lenses, Semiconducting wafers, Manufacturing, Reticles, Data modeling, Optical alignment, Lithography, Integrated circuits
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