Mr. Tomoyuki Enomoto Profile

Tomoyuki Enomoto

Chemist at Nissan Chemical Corp

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Author

Publications (11)

Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: part I

M. Hashimoto, H. Shiratori, K. Horii, Y. Yokoya, Y. Ohkubo, H. Takamizawa, Y. Fujimura, J. Morimoto, A. Manoshiro, M. Shimizu, T. Yokoyama, T. Enomoto, M. Nagai

Proceedings Volume 6349, 63490I (2006) https://doi.org/10.1117/12.693131

KEYWORDS: Etching, Chromium, Photoresist processing, SRAF, Diffusion, Scanning electron microscopy, Standards development, Chemically amplified resists, Photomasks, Optical lithography

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Proceedings Article | 20 October 2006 Paper

Multi-layer resist system for 45-nm-node and beyond: Part II

Yukihiro Fujimura, Jumpei Morimoto, Asuka Manoshiro, Mochihiro Shimizu, Hideyoshi Takamizawa, Masahiro Hashimoto, Hiroshi Shiratori, Katsuhiko Horii, Yasunori Yokoya, Yasushi Ohkubo, Tomoyuki Enomoto, Takahiro Sakaguchi, Masaki Nagai

Proceedings Volume 6349, 634936 (2006) https://doi.org/10.1117/12.692896

KEYWORDS: Etching, Dry etching, Resistance, Photoresist processing, Coating, Photomasks, Chromium, Fluorine, Ultraviolet radiation, Scanning electron microscopy

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Proceedings Article | 11 April 2006 Paper

Two-layer anti-reflection strategies for implant applications

Douglas Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, Tomoyuki Enomoto

Proceedings Volume 6153, 61530O (2006) https://doi.org/10.1117/12.656528

KEYWORDS: Lithography, Coating, Scanning electron microscopy, Photomicroscopy, Polymers, Bottom antireflective coatings, Semiconducting wafers, Silicon, Control systems, Photoresist processing

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Proceedings Article | 11 April 2006 Paper

Design and development of next-generation bottom anti-reflective coatings for 45nm process with hyper NA lithography

Makoto Nakajima, Takahiro Sakaguchi, Keisuke Hashimoto, Rikimaru Sakamoto, Takahiro Kishioka, Satoshi Takei, Tomoyuki Enomoto, Yasuyuki Nakajima

Proceedings Volume 6153, 61532L (2006) https://doi.org/10.1117/12.656132

KEYWORDS: System on a chip, Etching, Photoresist processing, Lithography, Photomasks, Silicon, Semiconducting wafers, Reflectivity, Bottom antireflective coatings, Carbon

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Proceedings Article | 4 May 2005 Paper

Optimization of 248nm bottom anti-reflective coatings with thin film and high etch rate on real device

MyoungSoo Kim, HakJoon Kim, KewChan Shim, JeHa Jeon, MyungGoon Gil, YongWook Song, Tomoyuki Enomoto, Takahiro Sakaguchi, Yasuyuki Nakajima

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599434

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Coating, Oxides, Thin films, Plasma etching, Semiconductors

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Proceedings Article | 4 May 2005 Paper

Bottom anti-reflective coatings for 193-nm bilayer system

Takahiro Sakaguchi, Tomoyuki Enomoto, Yasuyuki Nakajima

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598715

KEYWORDS: Silicon, Photoresist materials, Reflectivity, Etching, Oxides, Semiconducting wafers, Bottom antireflective coatings, Photoresist developing, Resistance, Silica

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Proceedings Article | 14 May 2004 Paper

Thin film and high-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Satoshi Takei, Takahiro Kishioka, Tadashi Hatanaka, Rikimaru Sakamoto, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534653

KEYWORDS: Reflectivity, Photoresist materials, Etching, Silicon, Semiconducting wafers, Plasma etching, Oxides, Bottom antireflective coatings, Thin films, Reflection

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Proceedings Article | 14 May 2004 Paper

Wet developable bottom anti-reflective coatings

Tadashi Hatanaka, Shigeo Kimura, Tomoyuki Enomoto, Yasuyuki Nakajima

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.534654

KEYWORDS: Photoresist materials, Reflectivity, Silicon, Photoresist developing, Ions, Doping, Coating, Semiconducting wafers, Photomasks, Bottom antireflective coatings

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Proceedings Article | 14 May 2004 Paper

New materials for 193-nm trilayer imaging

Jim Meador, Doug Holmes, Mariya Nagatkina, Rama Puligadda, Denise Gum, Randy Bennett, Sam Sun, Tomoyuki Enomoto

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533539

KEYWORDS: Etching, Plasma etching, Photoresist materials, Silicon, Plasma, Resistance, Reflectivity, Solids, Electroluminescence, Silicon films

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Proceedings Article | 12 June 2003 Paper

Thin film type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Keisuke Nakayama, Kenichi Mizusawa, Yasuyuki Nakajima, Sangwoong Yoon, Yong-Hoon Kim, Young-Ho Kim, Hoesik Chung, Sang Mun Chon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485060

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Etching, Semiconducting wafers, Lithography, Coating, Plasma etching, Bottom antireflective coatings, Thin films

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Proceedings Article | 24 August 2001 Paper

High-etch-rate type 248-nm bottom antireflective coatings

Tomoyuki Enomoto, Shinya Arase, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436915

KEYWORDS: Photoresist materials, Reflectivity, Etching, Semiconducting wafers, Plasma etching, Silicon, Coating, Bottom antireflective coatings, Plasma, Lithography

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Showing 5 of 11 publications

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