Dr. Yinjie Cen Profile

Dr. Yinjie Cen

at DuPont Electronics & Industrial

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 10 April 2024 Presentation + Paper

Advanced EUV CAR small molecule compounds design and its impact to etch performance

Yinjie Cen, Jong Keun Park, Suzanne Coley, Benjamin Naab-Rafael, Li Cui, Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129570A (2024) https://doi.org/10.1117/12.3010931

KEYWORDS: Etching, Photoresist materials, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 10 April 2024 Poster

Formulation and filtration strategies to reduce etch related defectivity of advanced chemically amplified EUV resist

Suzanne Coley, Jong Keun Park, Emad Aqad, Yinjie Cen, Li Cui, Conner Hoelzel, Benjamin Naab, Maria Melanson, Hung Tran, Stefan Alexandrescu, Rochelle Rena, Jason Behnke, Karen Petrillo

Proceedings Volume 12957, 129571Y (2024) https://doi.org/10.1117/12.3010919

KEYWORDS: Extreme ultraviolet, Stochastic processes, Etching, Photoresist processing, Photons, Manufacturing, Lithography, Design and modelling, Optical lithography, Materials processing

Read Abstract +

Proceedings Article | 9 April 2024 Paper

Impact of increasing EUV absorption of CAR polymers on lithographic performance

Yinjie Cen, Emad Aqad, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Rochelle Rena, Tyler Paul, Sylvie Eckert, Chunyi Wu, Mike Finch, Jason Behnke, ChoongBong Lee, Karen Petrillo

Proceedings Volume 12957, 129571Z (2024) https://doi.org/10.1117/12.3010961

KEYWORDS: Polymers, Extreme ultraviolet, Absorption, Extreme ultraviolet lithography, Photoresist materials, Line width roughness, Lithography

Read Abstract +

Proceedings Article | 9 April 2024 Presentation + Paper

Novel spin-on overcoat materials for EUV photoresist enhancement

Xisen Hou, Yinjie Cen, Paul Baranowsky, Karen Petrillo

Proceedings Volume 12957, 1295714 (2024) https://doi.org/10.1117/12.3010862

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Lithography

Read Abstract +

Proceedings Article | 9 April 2024 Poster + Paper

Identifying trends in photoresist polymer properties to improve line and space defects

Benjamin Rafael-Naab, Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Choong Bong Lee, Jason Behnke, Rochelle Rena, Sylvie Eckert, Stefan Alexandrescu, K. A. Niradha Sachinthani, Michael Finch, Karen Petrillo, Li Cheng

Proceedings Volume 12957, 129571S (2024) https://doi.org/10.1117/12.3010493

KEYWORDS: Defect inspection, Photoresist materials, Polymers, Line width roughness, Extreme ultraviolet lithography, Photoacid generators, Semiconducting wafers

Read Abstract +

Proceedings Article | 1 May 2023 Presentation + Paper

Understanding etch properties of advanced chemically amplified EUV resist

Jong Keun Park, Emad Aqad, Yinjie Cen, Suzanne Coley, Li Cui, Conner Hoelzel, Benjamin Naab, Choongbong Lee, Rochelle Rena, Philjae Kang, You Rim Shin, David Limberg, Lei Zhang

Proceedings Volume 12499, 124990I (2023) https://doi.org/10.1117/12.2659178

KEYWORDS: Etching, Iodine, Extreme ultraviolet, Plasma, Plasma etching, X-ray photoelectron spectroscopy, Photoresist materials, Extreme ultraviolet lithography, Light absorption, Absorption

Read Abstract +

Proceedings Article | 1 May 2023 Presentation + Paper

Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography

Xisen Hou, Yinjie Cen, Paul Baranowsky, Doris Kang, Cong Liu, Chengbai Xu

Proceedings Volume 12498, 124980Q (2023) https://doi.org/10.1117/12.2658882

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Lithography

Read Abstract +

Proceedings Article | 1 May 2023 Poster + Paper

Spin speed impact on photoresist thin film properties and EUV lithographic performance

Yinjie Cen, ChoongBong Lee, Li Cui, Suzanne Coley, Jong Keun Park, Benjamin Naab-Rafael, Emad Aqad, Rochelle Rena, Tyler Paul, Tom Penniman, Jason Behnke, Julia Early, Benjamin Foltz

Proceedings Volume 12498, 124981W (2023) https://doi.org/10.1117/12.2659101

KEYWORDS: Photoresist materials, Film thickness, Lithography, Extreme ultraviolet lithography, Line width roughness, Thin films, Surface roughness

Read Abstract +

Proceedings Article | 25 May 2022 Presentation + Paper

Thickness dependence of properties of EUV underlayer thin films

Jae Hwan Sim, Yoo-Jin Ghang, Jung-June Lee, Jae Yun Ahn, Jae-Bong Lim, Joo Sung Lee, Min Young Jeong, Soojung Leem, Youngeun Bae, Yinjie Cen, James Marsh, Lei Zhang

Proceedings Volume 12055, 120550B (2022) https://doi.org/10.1117/12.2613437

KEYWORDS: Thin films, Extreme ultraviolet, Polymers, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Chemical analysis, Silicon

Read Abstract +

Showing 5 of 9 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years