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Yu-Chi Su
at ASML Taiwan Ltd
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Publications (1)
Proceedings Article | 27 April 2023 Poster + Paper
Large field of view metrology: detecting critical edge placement error signatures not seen with small field of view in an HVM environment
Mohamed Ridane, Ivy Chen, Jaden Song, Peter Nikolsky, Kuan-Ming Chen, Shinyeong Lee, Sean Park, Kolos Lin, Yu-Chi Su, Kyoyeon Cho, Ethan Yu, James Park, Abdalmohsen Elmalk, Chih-Hung Hsieh, Alexander Serebryakov, Lei Zhang, Taekwon Jee, Joonsang You, Hong-Goo Lee, Jongmin Park, Jungchan Kim, Sang-Woo Kim, Seungmo Hong, Jaewook Seo
Proceedings Volume 12496, 124963C (2023) https://doi.org/10.1117/12.2659692
KEYWORDS: Metrology, Semiconducting wafers, High volume manufacturing, Line width roughness, Critical dimension metrology, Scanning electron microscopy, Optical lithography, Environmental sensing, Edge detection, Overlay metrology
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